Zobrazeno 1 - 1
of 1
pro vyhledávání: '"Richard T. Schultz"'
Publikováno v:
2012 Symposium on VLSI Technology (VLSIT).
VLSI technology scaling in the 32-nm node and beyond has presented designers with increasing challenges to obtain performance gains, power and area reductions each successive generation. Maximum voltage limits, decreasing interconnect performance, an
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::47557486e1c4ac8c7af95e2f6a8e00ff
https://doi.org/10.1109/vlsit.2012.6242504
https://doi.org/10.1109/vlsit.2012.6242504
