Zobrazeno 1 - 10
of 191
pro vyhledávání: '"Richard S. Crandall"'
Publikováno v:
Materials Research Express, vol 7, iss 9
Molina-Ruiz, M; Jacks, HC; Queen, DR; Wang, Q; Crandall, RS; & Hellman, F. (2018). Two-level systems and growth-induced metastability in hydrogenated amorphous silicon. UC Berkeley: Retrieved from: http://www.escholarship.org/uc/item/3t39x2vp
Molina-Ruiz, M; Jacks, HC; Queen, DR; Wang, Q; Crandall, RS; & Hellman, F. (2018). Two-level systems and growth-induced metastability in hydrogenated amorphous silicon. UC Berkeley: Retrieved from: http://www.escholarship.org/uc/item/3t39x2vp
Specific heat measurements from 2 to 300 K of hydrogenated amorphous silicon prepared by hot-wire chemical vapor deposition show a large excess specific heat at low temperature, significantly larger than the Debye specific heat calculated from the so
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a4e00e2657016abbdad6851c98b3c122
http://arxiv.org/abs/1809.07908
http://arxiv.org/abs/1809.07908
Autor:
Jian V. Li, Richard S. Crandall
Publikováno v:
Solar Energy Materials and Solar Cells. 129:13-16
By using transient-capacitance techniques we probe the mechanism of hole transport in amorphous/crystalline silicon heterojunction solar cells. The devices are formed by depositing undoped amorphous silicon followed by p-type amorphous silicon on n-t
Autor:
Richard S. Crandall, Qing Wang, Y. Xu, M. R. Page, Eugene Iwaniczko, L. Roybal, Falah S. Hasoon
Publikováno v:
Thin Solid Films. 519:4527-4530
We study the effect on various properties of varying the intrinsic layer (i-layer) thickness of amorphous/crystalline silicon heterojunction (SHJ) solar cells. Double-side monocrystalline silicon (c-Si) heterojunction solar cells are made using hot-w
Autor:
Julie Karel, Daniel Queen, Frances Hellman, Thomas Metcalf, Qi Wang, Xiao Liu, Richard S. Crandall
Publikováno v:
EPL (Europhysics Letters), vol 112, iss 2
Queen, DR; Liu, X; Karel, J; Wang, Q; Crandall, RS; Metcalf, TH; et al.(2015). Light-induced metastability in pure and hydrogenated amorphous silicon. EPL, 112(2). doi: 10.1209/0295-5075/112/26001. UC Berkeley: Retrieved from: http://www.escholarship.org/uc/item/0df7c490
EPL, vol 112, iss 2
Queen, DR; Liu, X; Karel, J; Wang, Q; Crandall, RS; Metcalf, TH; et al.(2015). Light-induced metastability in pure and hydrogenated amorphous silicon. EPL, 112(2). doi: 10.1209/0295-5075/112/26001. UC Berkeley: Retrieved from: http://www.escholarship.org/uc/item/0df7c490
EPL, vol 112, iss 2
Author(s): Queen, DR; Liu, X; Karel, J; Wang, Q; Crandall, RS; Metcalf, TH; Hellman, F | Abstract: Light soaking is found to increase the specific heat C and internal friction Q−1 of pure (a-Si) and hydrogenated (a-Si:H) amorphous silicon. At the l
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::febb4a00273350975cc9832f5218a962
https://escholarship.org/uc/item/0df7c490
https://escholarship.org/uc/item/0df7c490
Autor:
Xiao Liu, R.D. Merithew, Qi Wang, C.L. Spiel, Richard S. Crandall, Robert O. Pohl, Brent P. Nelson
Publikováno v:
Materials Science and Engineering: A. 442:307-313
We measured the low temperature internal friction of a variety of hydrogenated amorphous, nanocrystalline, polycrystalline, and epitaxial silicon thin films. Most of the films studied are prepared either by hot-wire chemical-vapor deposition (HWCVD)
Publikováno v:
Thin Solid Films. 430:249-252
We fabricate metal/a-Si/metal thin film switches which incorporate hot-wire chemical vapor deposition (HWCVD) Si layers. A H-diluted gas mixture is used to grow the B-doped, 1000 A hydrogenated amorphous silicon (a-Si:H) layers at approximately 10 A/
Autor:
Howard M. Branz, Brent P. Nelson, Richard S. Crandall, Robert C. Reedy, Harv Mahan, Yueqin Xu
Publikováno v:
Journal of Non-Crystalline Solids. :191-195
We observe that the charge state of diffusing hydrogen depends upon the electronic Fermi level ( E f ) in hydrogenated amorphous silicon (a-Si:H). We incorporate a thin layer of deuterium ( 2 H) at various positions between the n- and p-layers of i
Publikováno v:
Philosophical Magazine B. 82:185-195
We have recently found that the density of the low-energy excitations in amorphous silicon films and, in particular, in hydrogenated amorphous silicon (a-Si: H) films can decrease by over three orders of magnitude, to a level of complete disappearanc
Autor:
Xiao Liu, Richard S. Crandall
Publikováno v:
Thin Solid Films. 395:78-83
We review the present status of the elastic properties of amorphous silicon (a-Si) and germanium (a-Ge) thin films produced by either plasma-assisted chemical-vapor-deposition (PECVD) or hot-wire (cat) CVD (HWCVD). Using an extremely sensitive c-Si m
Autor:
Richard S. Crandall, Brent P. Nelson, Qi Wang, Eugene Iwaniczko, Yueqin Xu, Howard M. Branz, A. Harv Mahan
Publikováno v:
Thin Solid Films. 395:292-297
We grow hydrogenated amorphous silicon (a-Si:H) solar cells in a device structure denoted as SS/n–i–p/ITO. We grow all the a-Si:H layers by hot-wire chemical vapor deposition (HWCVD) and the indium-tin-oxide (ITO) by reactive evaporation. We are