Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Richard P Mcgouey"'
Autor:
Richard P Mcgouey, Sharon L. Nunes, Willi Volksen, Jeff W. Labadie, Eileen A. Galligan, R. A. Haring, James L. Hedrick
Publikováno v:
Journal of Materials Research. 10:1028-1037
A thermally stable copolymer of a polyimide and a dianiline terminated polydimethylsiloxane has been developed for use as a structural oxygen etch barrier material in high performance multilayer electronic wiring structures. We report on the preparat
Factors affecting the interconnection resistance and yield in multilayer polyimide/copper structures
Autor:
W. Graham, Eileen A. Galligan, Sharon L. Nunes, C.-A. Chang, D.-Y. Shih, Janusz S. Wilczynski, John J. Ritsko, J. Lewis, Chandrasekhar Narayan, Laura Beth Rothman, J. Cataldo, Richard P Mcgouey, Helen Li Yeh, Alina Deutsch, Jurij R. Paraszczak, Eric D. Perfecto, Russell J. Serino
Publikováno v:
IEEE Transactions on Components, Hybrids, and Manufacturing Technology. 16:74-88
The use of a lift-off technique to fabricate a high-density structure consisting of multiple layers of metal/polyimide thin-film structures on a silicon substrate is described. To achieve better performance and high yield, the process design, the pro
Autor:
W. Graham, G.V. Kopcsay, Sharon L. Nunes, Jurij R. Paraszczak, Janusz S. Wilczynski, J. Cataldo, Russell J. Serino, Eileen A. Galligan, Vincent Ranieri, D. Y. Shih, John J. Ritsko, Richard P Mcgouey, Alina Deutsch
Publikováno v:
IBM Journal of Research and Development. 34:601-615
This paper addresses some of the problems encountered in propagating high-speed signals on lossy transmission lines encountered in high-performance computers. A technique is described for including frequency-dependent losses, such as skin effect and
Autor:
Michael Hatzakis, N J Chou, Richard P Mcgouey, Edward D. Babich, Jurij R. Paraszczak, David F. Witman, J. M. Shaw
Publikováno v:
Microelectronic Engineering. 11:503-506
Different types of polyfunctional organosilicon compounds (chloro-, alkoxy-, acetoxysilanes, linear and cyclic silazanes and silylamines) were studied as silylating agents in the diffusion limited heterogeneous silylation process. It was shown that c
Autor:
Eric D. Perfecto, Jurij R. Paraszczak, John J. Ritsko, Laura Beth Rothman, Russell J. Serino, D. Y. Shih, Helen Li Yeh, C.-A. Chang, Chandrasekhar Narayan, Richard P Mcgouey, J. Lewis, Alina Deutsch, W. Graham, Sharon L. Nunes, Janusz S. Wilczynski, J. Cataldo, Eileen A. Galligan
Publikováno v:
1992 Proceedings 42nd Electronic Components & Technology Conference.
The use of a lift-off technique to fabricate a high-density structure consisting of multiple layers of metal/polyimide thin film structure on a silicon substrate is described. To achieve better performance and high yield, the authors evaluated the pr
Autor:
John J. Ritsko, W. Volksen, W. Graham, Donald C. Hofer, Richard P Mcgouey, J. W. Labadie, Sharon L. Nunes, J. L. Hedrick, Eileen A. Galligan, Katherine L. Saenger, G.V. Kopcsay, Jurij R. Paraszczak, Ronald D. Goldblatt, Russell J. Serino, Edward D. Babich, David F. Witman, Helen Li Yeh, Vincent Ranieri, Laura Beth Rothman, D. Y. Shih, Chandrasekhar Narayan, Janusz S. Wilczynski, J. Cataldo, Alina Deutsch, J. M. Shaw
Publikováno v:
1991 Proceedings 41st Electronic Components & Technology Conference.
Multilayer copper/polyimide interconnect structures were fabricated using a reactive-ion-etching-based lift-off technique. Conductor cross-sectional area control, planarity, and a gap-free structure were made possible by the use of a novel siloxane-p
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 45:216-218
The diffusion of Si in thin films of photoresist during silylation was investigated using Rutherford backscattering spectroscopy (RBS) and the chemical reaction was studied by X-ray photoemission spectroscopy (XPS). Initially, Si diffuses very rapidl
Autor:
Janusz S. Wilczynski, J. Cataldo, John J. Ritsko, Richard P Mcgouey, Jurij R. Paraszczak, D.-Y. Shih, Gerard V. Kopcsay, W. Graham, Alina Deutsch, Sharon L. Nunes, Eileen A. Galligan, Russell J. Serino, Vincent Ranieri
Publikováno v:
SPIE Proceedings.
This paper discusses the maximum usable length (''max) for high-speed pulse propagation and its dependence on signal line resistance (R) for a range of wiring technologies. As an example we present results from measurements and analyses of experiment
Autor:
Ned J. Chou, L. Ferreiro, John E. Heidenreich, Richard P Mcgouey, Michael Hatzakis, Edward D. Babich, Jurij R. Paraszczak
Publikováno v:
SPIE Proceedings.
A multilayer resist structure is typically composed of at least two materials, an oxygen plasma resistant layer and a planarising layer which is eroded in an oxygen based plasma. This structure is then subjected to a variety of excited and ground sta