Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Richard Janek"'
Autor:
Pan Yang, Richard A. Gottscho, Thorsten Lill, Keren J. Kanarik, John D. Boniface, Andreas Fischer, Richard Janek, Vahid Vahedi
Publikováno v:
SPIE Proceedings.
In this paper, we report on plasma assisted thermal Atomic Layer Etching (ALE) of Al2O3. The surface was modified via a fluorine containing plasma without bias power. The removal was accomplished by a thermal reaction step using tin-(II) acetylaceton
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bbd18e63db1cfd543e81633ab5bc65db
https://doi.org/10.1117/12.2258129
https://doi.org/10.1117/12.2258129
Publikováno v:
ECS Transactions. 33:145-158
The morphology and behavior of thin Cu films deposited using electroless, electrolytic, and physical vapor deposition (PVD) is studied using Ru as a substrate. Ru was deposited by both PVD and atomic layer deposition (ALD). Electrolessly deposited Cu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4fd966991f3941ff66506b5c967ac2b6
https://doi.org/10.1149/1.3485251
https://doi.org/10.1149/1.3485251
Publikováno v:
ECS Meeting Abstracts. :1428-1428
not Available.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::380f7e10719f5597f7acda6f4ae2efcc
https://doi.org/10.1149/ma2010-02/20/1428
https://doi.org/10.1149/ma2010-02/20/1428