Zobrazeno 1 - 10
of 67
pro vyhledávání: '"Richard H. Stulen"'
Autor:
Richard H. Stulen, Michael L. Knotek
These proceedings are the result of the third international workshop on Desorption Induced by Electronic Transitions, DIET III, which took place on Shelter Island, NY, May. 20-22, 1987. The work contained in this volume is an excellent summary of the
Autor:
Karen L. Jefferson, William C. Replogle, David Attwood, Donald W. Sweeney, Layton C. Hale, Donna J. O'Connell, Leonard E. Klebanoff, Alvin H. Leung, John B. Wronosky, Henry N. Chapman, Daniel A. Tichenor, Patrick P. Naulleau, Sang H. Lee, Glenn D. Kubiak, Kenneth A. Goldberg, James A. Folta, John S. Taylor, W. P. Ballard, Richard H. Stulen, John E. M. Goldsmith
Publikováno v:
Journal of Photopolymer Science and Technology. 15:351-360
The EUV Engineering Test Stand (ETS) has demonstrated the printing of static and scanned 100nm dense features. This milestone was first achieved in 2001 with a developmental set of projection optics (P0 Box 1) and with a low power LPP source (40W dri
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ba47eb97d48391b875d33b506bf66d72
https://doi.org/10.2494/photopolymer.15.351
https://doi.org/10.2494/photopolymer.15.351
Autor:
Richard H. Stulen
Publikováno v:
Microelectronic Engineering. 46:19-22
Extreme Ultraviolet Lithography (EUV) is viewed by many as the logical extension of current optical lithography which will enable future generations of integrated circuits (ICs) to be printed with feature sizes of 100nm and below. With the completion
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bdfd1934e466c7f25fe0ca136d16c379
https://doi.org/10.1016/s0167-9317(99)00007-6
https://doi.org/10.1016/s0167-9317(99)00007-6
Publikováno v:
Journal of Applied Physics. 77:3484-3490
Temperature programmed desorption was used to measure the desorption kinetics of hydrogen and its isotopes from chemical vapor deposited diamond surfaces. The desorption spectra are surprisingly simple considering the polycrystalline nature of the sa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::79c3584c5187d33dd6765a8575cc450e
https://doi.org/10.1063/1.358642
https://doi.org/10.1063/1.358642
Autor:
Obert R. Wood, William C. Sweatt, Kurt W. Berger, W. K. Waskiewicz, Daniel A. Tichenor, Donald Lawrence White, Richard H. Stulen, Richard R. Freeman, Marc D. Himel, David L. Windt, Jeffrey Bokor, Steven J. Haney, John E. Bjorkholm, L. A. Brown, Glenn D. Kubiak, Donald M. Tennant, William M. Mansfield, Tanya E. Jewell, Alastair A. MacDowell, Michael E. Malinowski
Publikováno v:
Applied optics. 32(34)
Soft-x-ray projection imaging is demonstrated by the use of 14-nm radiation from a laser plasma source and a single-surface multilayer-coated ellipsoidal condenser. Aberrations in the condenser and the Schwarzschild imaging objective are characterize
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::049349f21fda670c0a21a5de2505210f
https://pubmed.ncbi.nlm.nih.gov/20856569
https://pubmed.ncbi.nlm.nih.gov/20856569
Autor:
Donald Lawrence White, Richard R. Freeman, Donald M. Tennant, William M. Mansfield, Michael E. Malinowski, Daniel A. Tichenor, L. A. Brown, Richard H. Stulen, Steven J. Haney, Kurt W. Berger, W. K. Waskiewicz, John E. Bjorkholm, Obert R. Wood, David L. Windt, Alastair A. MacDowell, Tanya E. Jewell, Glenn D. Kubiak, Jeffrey Bokor
Publikováno v:
Optics letters. 16(20)
Projection imaging of 0.1-microm lines and spaces is demonstrated with a Mo/Si multilayer coated Schwarzschild objective and 14-nm illumination from a laser plasma source. This structure has been etched into a silicon wafer by using a trilevel resist
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c1acabfa8efa5e3659c1e1c25660a731
https://pubmed.ncbi.nlm.nih.gov/19777030
https://pubmed.ncbi.nlm.nih.gov/19777030
Autor:
Richard R. Freeman, Richard H. Stulen
Publikováno v:
AT&T Technical Journal. 70:37-48
The circuit-integration densities needed for semiconductor devices in the late 1990s will require advanced patterning technologies that can print line widths of 0.2 micrometers or less. Because it uses shorter wavelengths, X-ray lithography is one of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dc6d18ea7f2375643383b6c58521b68d
https://doi.org/10.1002/j.1538-7305.1991.tb00136.x
https://doi.org/10.1002/j.1538-7305.1991.tb00136.x
Publikováno v:
Surface Science. 237:35-52
Upon heating to greater than 1300 K, diamond C(100)-(1 × 1) reconstructs, exhibiting a low energy electron diffraction (LEED) pattern with two domains of (2 × 1) symmetry. No evidence for higher order reconstructions (e.g., c(4 × 2)) is observed,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b96a60470c454db49eecad2187381ada
https://doi.org/10.1016/0039-6028(90)90517-c
https://doi.org/10.1016/0039-6028(90)90517-c
Publikováno v:
Journal of Applied Physics. 68:86-92
The effects of chemical etching in KI solution, heating, and vacuum exposures of HgI2 were individually studied by low‐temperature photoluminescence (PL) spectroscopy. Each of these processing steps is important in the manufacturing of mercuric iod
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0f27146548f27471f28650bf411e76e1
https://doi.org/10.1063/1.347074
https://doi.org/10.1063/1.347074
Autor:
Mial E. Warren, William C. Sweatt, Kevin D. Krenz, Stanley H. Kravitz, Avijit K. Ray-Chaudhuri, Richard H. Stulen, D. I. Simon, Michael R. Descour
Publikováno v:
Optics letters. 23(1)
The microtag concept is an anticounterfeiting and security measure. Microtags are computer-generated holograms (CGH's) consisting of 150-nm lines arranged to form 300-nm-period gratings. The microtags that we describe were designed for readout at 442
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2d72a58f51ff245647ae101b9a8db965
https://pubmed.ncbi.nlm.nih.gov/18084396
https://pubmed.ncbi.nlm.nih.gov/18084396