Sensitivity enhancement of a high-resolution negative-tone nonchemically amplified metal organic photoresist for extreme ultraviolet lithography

Autor: Antonio Fernandez Mato, Lewis, Scott M., Alty, Hayden R., Michaela Vockenhuber, Derose, Guy A., Dimitrios Kazazis, Winpenny, Paul L., Richard Grindell, Timco, Grigore A., Axel Scherer, Yasin Ekinci, Winpenny, Richard E. P.

Publikováno v: Antonio Fernandez Mato
Journal of Micro/Nanopatterning, Materials, and Metrology

A new class of negative-tone resist materials has been developed for electron beam and extreme ultraviolet lithography. The resist is based on heterometallic rings. From initial electron beam lithography studies, the resist performance demonstrated a

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a6d5d7cbda09dc6cbd4b2e9882e1790b
https://resolver.caltech.edu/CaltechAUTHORS:20220721-8168000

Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography

Autor: Scott M. Lewis, Guy A. DeRose, Hayden R. Alty, Matthew S. Hunt, Nathan Lee, James A. Mann, Richard Grindell, Alex Wertheim, Lucia De Rose, Antonio Fernandez, Christopher A. Muryn, George F. S. Whitehead, Grigore A. Timco, Axel Scherer, Richard E. P. Winpenny

Publikováno v: Antonio Fernandez Mato
Lewis, S M, DeRose, G A, Alty, H R, Hunt, M S, Lee, N, Mann, J A, Grindell, R, Wertheim, A, De Rose, L, Fernandez, A, Muryn, C A, Whitehead, G F S, Timco, G A, Scherer, A & Winpenny, R E P 2022, ' Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography ', Advanced Functional Materials, vol. 32, no. 32, 2202710 . https://doi.org/10.1002/adfm.202202710

A new class of electron bean negative tone resist materials has been developed based on heterometallic rings. The initial resist performance demonstrates a resolution of 15 nm half-pitch but at the expense of a low sensitivity. To improve sensitivity

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::44d4c67f71d03b797d4b219a30c11339
https://resolver.caltech.edu/CaltechAUTHORS:20220718-951245300