Zobrazeno 1 - 10
of 32
pro vyhledávání: '"Richard C. Tiberio"'
Autor:
Anqi Ji, Jung-Hwan Song, Qitong Li, Fenghao Xu, Ching-Ting Tsai, Richard C. Tiberio, Bianxiao Cui, Philippe Lalanne, Pieter G. Kik, David A. B. Miller, Mark L. Brongersma
Publikováno v:
Nature Communications, Vol 13, Iss 1, Pp 1-7 (2022)
The authors present an approach to phase imaging by using the non-local optical response of a guided-moderesonator metasurface. They demonstrate that this metasurface can be added to a conventional microscope to enable quantitative phase contrast ima
Externí odkaz:
https://doaj.org/article/690a86dc29554f288705173ca025df5f
Autor:
Richard C. Tiberio, David L. Allara, Michael J. Lercel, G. F. Redinbo, M. J. Rooks, C. W. Sheen, Harold G. Craighead
Publikováno v:
Microelectronic Engineering. 27:43-46
Self-assembled monolayers have been demonstrated to perform as high-resolution electron beam resists with minimum resolutions of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::43e730a5e71b39957652ed5752961fed
https://doi.org/10.1016/0167-9317(94)00052-v
https://doi.org/10.1016/0167-9317(94)00052-v
Autor:
Seng-Tiong Ho, Maria K. Udo, T. Y. Chang, D. Y. Chu, P. F. Chapman, R. P. Espindola, S. L. Wu, H. Q. Hou, Richard C. Tiberio
Publikováno v:
Applied Physics Letters. 68:241-243
We report on the fabrication and characterization of broadband Bragg filters in microfabricated AlGaAs waveguides. Electron‐beam lithography and chemically assisted ion‐beam etching were used to fabricate first‐order gratings with 250 nm period
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b792fab39b22cda1c4fcd52d9cadc310
https://doi.org/10.1063/1.116473
https://doi.org/10.1063/1.116473
Publikováno v:
Applied Physics Letters. 66:3401-3403
We report the observation of all‐optical switching in a metal–semiconductor–metal waveguide structure. A silicon‐on‐insulator waveguide with aluminum interdigitated fingers deposited on the surface and overcoated with amorphous silicon prov
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5dda56e3fa22c321ad4742ec2c4becf5
https://doi.org/10.1063/1.113367
https://doi.org/10.1063/1.113367
Autor:
Richard C. Tiberio, D. Sheth, Robert R. Krchnavek, Rodney S. Ruoff, Henry W. Rohrs, B. Faircloth
Publikováno v:
Proceedings of the 2001 1st IEEE Conference on Nanotechnology. IEEE-NANO 2001 (Cat. No.01EX516).
One of the greatest challenges facing nanotechnology is the ability to selectively place nanoscale entities in specific locations and subsequently interconnect these devices. Several methods have been proposed and the relative strengths of each techn
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f440582127d80d86bd8bb140d01a51a2
https://doi.org/10.1109/nano.2001.966390
https://doi.org/10.1109/nano.2001.966390
Autor:
T. Lau, Michael J. Lercel, Harold G. Craighead, Richard C. Tiberio, David L. Allara, C. W. Sheen
Publikováno v:
Applied Physics Letters. 62:476-478
We present results on electron beam exposure of a self‐assembled monolayer film as a self‐developing positive resist on GaAs. A 1.5 nm thick monolayer of n‐octadecanethiol (C18H37SH) deposited on a GaAs (100) substrate showed a electron beam se
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1ac4edc62c88e9d56428a57edf4a33d5
https://doi.org/10.1063/1.108938
https://doi.org/10.1063/1.108938
Autor:
Elizabeth A. Dobisz, Anne Sakdinawat, M. J. Rooks, Clifford F. Knollenberg, Richard C. Tiberio, Chieh Chang
Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 32:06FI01
High aspect ratio nanoscale features are becoming increasingly important in a wide range of applications. In this paper, the authors describe the concepts of vertical directionality-controlled metal-assisted chemical etching (V-MaCE) and demonstrate
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::471043fb8e26f06e2394fec5004a6b54
https://doi.org/10.1116/1.4898199
https://doi.org/10.1116/1.4898199
Autor:
L. Rathbun, Yuli Vladimirsky, Olga Vladimirsky, Q. Leonard, Lei Yang, James W. Taylor, Srinivas B. Bollepalli, Richard C. Tiberio, Jaz Bansel, Mumit Khan, Franco Cerrina, Klaus Simon
Publikováno v:
SPIE Proceedings.
Availability of production-worthy x-ray masks is of great concern to the lithographic community in anticipation of insertion of x-ray lithography as the leading contender among the next generation lithographies.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8289491f50e34e4ef03a3a8fb8a83cb6
https://doi.org/10.1117/12.351147
https://doi.org/10.1117/12.351147
Autor:
Dustin W. Carr, Richard C. Tiberio
Publikováno v:
MRS Proceedings. 584
Direct-write electron beam lithography is a patterning technique that has rapidly evolved over the last 40 years. For many years it has been possible to use electrons to pattern lines with widths as narrow as 10 rum. Recent advances in resist materia
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::84a9bb31b9502af20f8812b629330c4c
https://doi.org/10.1557/proc-584-33
https://doi.org/10.1557/proc-584-33
Publikováno v:
SPIE Proceedings.
We show that very narrow fin-like periodic nanostructure with 0.1 micrometer width, 1 micrometer depth, and a few microns length can be fabricated on AlGaAs using Chemically-Assisted- Ion-Beam-Etching with oxidized AlGaAs as negative mask. This techn
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f367f7667274c52e78b603b717b1d608
https://doi.org/10.1117/12.318000
https://doi.org/10.1117/12.318000