Zobrazeno 1 - 2
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pro vyhledávání: '"Riaid Alsaeedi"'
Autor:
Z. Ozdemir, Riaid Alsaeedi
Publikováno v:
Materials
Materials, Vol 11, Iss 11, p 2286 (2018)
Volume 11
Issue 11
Materials, Vol 11, Iss 11, p 2286 (2018)
Volume 11
Issue 11
Chemical mechanical polishing (CMP) has been introduced in previous studies as a synergistic technique to modify the surface chemistry and topography of titanium-based implants to control their biocompatibility. In this study, the effectiveness of CM
Autor:
Alsaeedi, Riaid1,2 salih.alsaeedi@ozu.edu.trZeynepozdemir34@gmail.com, Ozdemir, Z.1
Publikováno v:
Materials (1996-1944). Nov2018, Vol. 11 Issue 11, p2286. 1p. 5 Color Photographs, 1 Chart, 7 Graphs.