Response to commentaries : Resnik, D. B. and K. A. DeVille. 2002. "Bioterrorism and patient rights: 'compulsory licensure' and the case of Cipro." The American Journal of Bioethics 2(3): 29-39.

Autor: Resnik DB; East Carolina University, USA., DeVille KA

Publikováno v: The American journal of bioethics : AJOB [Am J Bioeth] 2002 Fall; Vol. 2 (4), pp. W1.

Microstructural and electrical properties of heat treated resistive Ti/Pt thin layers

Autor: Resnik, D., Kovač, J., Vrtačnik, D., Godec, M., Pečar, B., Možek, M.

Publikováno v: In Thin Solid Films 1 October 2017 639:64-72

Editors' Statement on the Responsible Use of Generative AI Technologies in Scholarly Journal Publishing.

Autor: Kaebnick GE; The Hastings Center., Magnus DC; Stanford University., Kao A; American Medical Association., Hosseini M; Northwestern University., Resnik D; NIEHS., Dubljević V; North Carolina State University., Rentmeester C; American Medical Association., Gordijn B; Dublin City University., Cherry MJ; St Edwards University School of Humanities.

Publikováno v: The American journal of bioethics : AJOB [Am J Bioeth] 2024 Mar; Vol. 24 (3), pp. 5-8. Date of Electronic Publication: 2023 Dec 12.

Correction: Editors' statement on the responsible use of generative AI technologies in scholarly journal publishing.

Autor: Kaebnick GE; The Hastings Center, Putnam Country, USA. kaebnickg@thehastingscenter.org., Magnus DC; Stanford University, Stanford, USA., Kao A; American Medical Association, Chicago, USA., Hosseini M; Northwestern University, Evanston, USA., Resnik D; U.S. National Institute of Environmental Health Sciences, Durham, USA., Dubljević V; North Carolina State University, Raleigh, USA., Rentmeester C; American Medical Association, Chicago, USA., Gordijn B; Dublin City University, Dublin, Ireland., Cherry MJ; St. Edwards University, Austin, USA.

Publikováno v: Medicine, health care, and philosophy [Med Health Care Philos] 2023 Dec; Vol. 26 (4), pp. 505.

The influence of target composition and thermal treatment on sputtered Al thin films on Si and SiO2 substrates

Autor: Resnik, D., Kovač, J., Godec, M., Vrtačnik, D., Možek, M., Amon, S.

Publikováno v: In Microelectronic Engineering August 2012 96:29-35