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pro vyhledávání: '"Ren-Mao Liao"'
Autor:
Ren-Mao Liao, 廖仁懋
100
In this study, an organosilicon/silicon oxide (SiOx) thin film prepared using plasma-enhanced chemical vapor deposition (PECVD) using tetramethylsilane (TMS) monomer and TMS-oxygen gas mixture was consecutively deposited onto the flexible pl
In this study, an organosilicon/silicon oxide (SiOx) thin film prepared using plasma-enhanced chemical vapor deposition (PECVD) using tetramethylsilane (TMS) monomer and TMS-oxygen gas mixture was consecutively deposited onto the flexible pl
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/au3k8b
Publikováno v:
Surface and Coatings Technology. 280:92-99
In this study, we demonstrated the effect of the organosilicon layer in the pairs of the organosilicon/silicon oxide (SiO x ) multi-layered structure on the barrier property to water vapor permeation and on the mechanical flexibility under tensile st
Publikováno v:
Surface and Coatings Technology. 206:4685-4691
An organosilicon/silicon oxide (SiO x ) multilayered barrier structure was consecutively deposited onto the polyethylene terephthalate (PET) substrate by plasma-enhanced chemical vapor deposition (PECVD) using tetramethylsilane (TMS) monomer and TMS
Publikováno v:
International Journal of Engineering and Technology Innovation, Vol 2, Iss 3 (2012)
International Journal of Engineering and Technology Innovation, Vol 2, Iss 3, Pp 184-194 (2012)
International Journal of Engineering and Technology Innovation, Vol 2, Iss 3, Pp 184-194 (2012)
A multilayered barrier structure stacked with organosilicon and silicon oxide (SiOx) films consecutively prepared using plasma-enhanced chemical vapor deposition (PECVD) was developed to encapsulate flexible plastic substrate. The evolution on the re