Výsledky vyhledávání - "René H J Vervuurt"

Akademický článek

Diffraction enhanced transparency in a hybrid gold-graphene THz metasurface

Autor: Niels J. J. van Hoof, Stan E. T. ter Huurne, René H. J. Vervuurt, Ageeth A. Bol, Alexei Halpin, Jaime Gómez Rivas

Publikováno v: APL Photonics, Vol 4, Iss 3, Pp 036104-036104-8 (2019)

Terahertz (THz) near-field microscopy is used to investigate the underlying physics that leads to diffraction enhanced transparency (DET) in a periodic array of detuned metallic rods. At the transparency frequency, the system is highly dispersive and

Externí odkaz: https://doaj.org/article/ab8f3718231a4c77b0c0354d5727e94b

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Reaction Mechanism and Selectivity Control of Si Compound ALE Based on Plasma Modification and F-Radical Exposure

Autor: Kazuya Nakane, Takayoshi Tsutsumi, B. Mukherjee, René H. J. Vervuurt, Nobuyoshi Kobayashi, Masaru Hori

Publikováno v: Langmuir : the ACS journal of surfaces and colloids. 37(43)

In this work, atomic layer etching (ALE) of Si compounds using H2 or N2 plasma modification followed by fluorine radical exposure is discussed. It is shown that the H2 plasma modification process promotes the selective etching of SiN, SiC, and SiCO v

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f0a2784419bdd80c1cf69dcbd679acf4
https://pubmed.ncbi.nlm.nih.gov/34666489

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In Situ Monitoring of Surface Reactions during Atomic Layer Etching of Silicon Nitride Using Hydrogen Plasma and Fluorine Radicals

Autor: Takayoshi Tsutsumi, René H. J. Vervuurt, Nobuyoshi Kobayashi, Masaru Hori, Kazuya Nakane

Publikováno v: ACS Applied Materials & Interfaces. 11:37263-37269

The atomic layer etching (ALE) of silicon nitride (SiN) via a hydrogen plasma followed by exposure to fluorine radicals was investigated by using in situ spectroscopic ellipsometry and attenuated t...

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::1ad4699660ca326d0ccf18802fa50328
https://doi.org/10.1021/acsami.9b11489

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Stability of CoPx Electrocatalysts in Continuous and Interrupted Acidic Electrolysis of Water

Autor: Emiel J. M. Hensen, René H. J. Vervuurt, Ageeth A. Bol, Lu Gao, Jan P. Hofmann, Roderigh Y. Rohling, Andrey Goryachev, Yue Zhang

Publikováno v: Chemelectrochem
ChemElectroChem, 5(8), 1230-1239. Wiley

Cobalt phosphides are an emerging earth-abundant alternative to platinum-group-metal-based electrocatalysts for the hydrogen evolution reaction (HER). Yet, their stability is inferior to platinum and compromises the large-scale applicability of CoPx

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b432973c2fa6b933326cfe6ba3c99d51
http://europepmc.org/articles/PMC5915747

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Uniform atomic layer deposition of Al2O3 on graphene by reversible hydrogen plasma functionalization

Autor: Wilhelmus M. M. Kessels, Marcel A. Verheijen, Ageeth A. Bol, René H. J. Vervuurt, Bora Karasulu

Publikováno v: Chemistry of Materials, 29(5), 2090-2100. American Chemical Society

A novel method to form ultrathin, uniform Al2O3 layers on graphene using reversible hydrogen plasma functionalization followed by atomic layer deposition (ALD) is presented. ALD on pristine graphene is known to be a challenge due to the absence of da

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::08a7df8c1583f890c83e95046c2fd568
https://doi.org/10.1021/acs.chemmater.6b04368

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Atomic layer deposition of Pd and Pt nanoparticles for catalysis

Autor: Adriaan J. M. Mackus, Ageeth A. Bol, Diana Garcia-Alonso, René H. J. Vervuurt, Marcel A. Verheijen, Wilhelmus M. M. Kessels, Nick F. W. Thissen, Simone Assali, Matthieu Weber

Publikováno v: Nanotechnology, 27(3):034001, 1-13. Institute of Physics

The deposition of Pd and Pt nanoparticles by atomic layer deposition (ALD) has been studied extensively in recent years for the synthesis of nanoparticles for catalysis. For these applications, it is essential to synthesize nanoparticles with well-de

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::42c776aedf70d5384672add19f7ec4d9
https://research.tue.nl/en/publications/c8a9179f-0c0f-45e0-8456-be9366e7d15a

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Continuous and ultrathin platinum films on graphene using atomic layer deposition: a combined computational and experimental study

Autor: Bora Karasulu, Wilhelmus M. M. Kessels, René H. J. Vervuurt, Ageeth A. Bol

Publikováno v: Nanoscale, 8(47), 19829-19845. Royal Society of Chemistry

Integrating metals and metal oxides with graphene is key in utilizing its extraordinary material properties that are ideal for nanoelectronic and catalyst applications. Atomic layer deposition (ALD) has become a key technique for depositing ultrathin

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d5f23bbc53a531ece5e2cb44413f0fed
https://doi.org/10.1039/c6nr07483a

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Broadband optical response of graphene measured by terahertz time-domain spectroscopy and FTIR spectroscopy

Autor: Jaime Gómez Rivas, René H. J. Vervuurt, Karsten Arts, Arkabrata Bhattacharya, J. W. Oosterbeek, Ageeth A. Bol

Publikováno v: Journal of Applied Physics
Journal of Applied Physics, 124, 073105
Journal of Applied Physics, 124(7):073105. American Institute of Physics

This work describes the broadband optical response of graphene grown by chemical vapor deposition by combining terahertz time-domain spectroscopy (THz-TDS) at 0.25-1.7 THz (8-60 cm−1) with Fourier Transform Infrared Spectroscopy (FTIR) at 11-210 TH

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::488576395c66be43a92986e52a251dbd
https://doi.org/10.1063/1.5044265

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