Inductively coupled remote plasma-enhanced chemical vapor deposition (rPE-CVD) as a versatile route for the deposition of graphene micro- and nanostructures

Autor: Michael Foerster, I. Šics, Markos Paradinas, M. G. Cuxart, Alejandro R. Goñi, H. Moreno Fernandez, Eric Pellegrin, Guillaume Sauthier, V. Carlino, Lucia Aballe, Elzbieta Pach

Publikováno v: Recercat: Dipósit de la Recerca de Catalunya
Varias* (Consorci de Biblioteques Universitáries de Catalunya, Centre de Serveis Científics i Acadèmics de Catalunya)
Dipòsit Digital de Documents de la UAB
Universitat Autònoma de Barcelona
Digital.CSIC. Repositorio Institucional del CSIC
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Recercat. Dipósit de la Recerca de Catalunya

Multiple layers of graphene thin films with micro-crystalline orientation and vertical graphene nano-sheets were grown on different substrates (i.e., polycrystalline nickel foil, Ni(111), highly oriented pyrolytic graphite) using a single-step proces

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d5012a1042aedbe70aa76c9cf285731b
https://ddd.uab.cat/record/225310