Zobrazeno 1 - 10
of 130
pro vyhledávání: '"Remis Gaska"'
Publikováno v:
Solid-State Electronics. 113:22-27
High electron concentration in 2DEG channel of AlInN/GaN devices is remarkably stable over a broad temperature range, enabling device operation above 500 °C. The developed IC technology is based on three key elements: (1) exceptional quality AlInN/G
Publikováno v:
physica status solidi c. 11:853-856
We report on GaN microwave varactors with capacitively coupled isolated electrodes. Metal-insulator-semiconductor (MIS) varactors have 4–5 orders of magni-tude lower leakage currents than similar devices with Schottky contacts. Low leakage capaciti
Publikováno v:
ECS Transactions. 58:129-143
Group III-Nitride based devices are expected to compete and possibly outperform state of the art silicon carbide based devices for power electronic applications. GaN, AlGaN, AlInGaN and other III-Nitride compound materials offer a very high breakdown
Autor:
Maxim S. Shatalov, Saulius Marcinkevicius, Remis Gaska, Vytautas Liuolia, Daniel Billingsley, Michael Shur, Jinwei Yang
Publikováno v:
physica status solidi c. 10:853-856
Photoexcited carrier dynamics and localization potentials in Al0.86In0.14N/GaN heterostructure have been examined by time-resolved photoluminescence (PL), transient photoreflectance and scanning near-field optical spectroscopy. The large GaN and AlIn
Autor:
Vytautas Liuolia, Michael Shur, Remis Gaska, Saulius Marcinkevicius, Jinwei Yang, Andrea Pinos
Publikováno v:
physica status solidi c. 9:1617-1620
Band gap fluctuations and carrier localization in AlxGa1-xN films with x values varying from 0.30 to 0.50 has been studied by scanning near-field optical microscopy (SNOM) by measuring photoluminescence. The measurements have revealed a dual localiza
Publikováno v:
International Journal of High Speed Electronics and Systems. 20:219-227
III-Nitride heterostructure field-effect transistors (HFETs) demonstrated a new paradigm in microwave switching and control applications due to unique combination of extremely low channel resistance (leading to low loss), very high RF power, low off-
Publikováno v:
IEEE Electron Device Letters. 35:449-451
The novel HFET design using perforated channel region under the gate reduces drain and source parasitic resistances due to the current spreading effect in the source-gate and gate-drain regions. Demonstrated results for AlGaN/GaN HFET show that the R
Publikováno v:
International Journal of High Speed Electronics and Systems. 19:7-14
We present a novel approach to achieve terahertz-range cutoff frequencies and maximum frequencies of operation of GaN based heterostructure field-effect transistors (HFETs) at relatively high drain voltages. Strong short-channel effects limit the fre
Autor:
C. J. Collins, Paul H. Shen, Michael Wraback, Xuhong Hu, J. Deng, Meredith Reed, Remis Gaska, Jianping Zhang, A. Lunev, Thomas M. Katona, Anand V. Sampath, Gregory A. Garrett, Yuriy Bilenko
Publikováno v:
International Journal of High Speed Electronics and Systems. 18:179-185
We present material and device characterization of 280 nm semiconductor ultraviolet light emitting diodes. These devices exhibit low series resistance, wavelength stability with increasing current, and have a half-life in excess of 570hrs, depending