Zobrazeno 1 - 10
of 109
pro vyhledávání: '"Remi Dussart"'
Autor:
Aurélie Girard, Neal Fairley, Rim Ettouri, Remi Dussart, Bertrand Boutaud, Philippe Lefaucheux, Vincent Fernandez, Thomas Tillocher, Christophe Cardinaud
Publikováno v:
Surface and Interface Analysis
Surface and Interface Analysis, Wiley-Blackwell, 2021, pp.110508. ⟨10.1002/sia.7030⟩
Surface and Interface Analysis, Wiley-Blackwell, 2021, pp.110508. ⟨10.1002/sia.7030⟩
International audience; Plasma etching techniques can result in damage and contamination of materials, which, if not removed, can interfere with further processing. Therefore, characterisation of the etched surface is necessary to understand the basi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::cdec3c08546f2ddbafb1a960a5edbf82
https://doi.org/10.1002/sia.7030
https://doi.org/10.1002/sia.7030
Autor:
Philippe Lefaucheux, Christian Dussarrat, R. Chanson, Jean-Francois de Marneffe, Thomas Tillocher, Remi Dussart
Publikováno v:
Frontiers of Chemical Science and Engineering. 13:511-516
The integration of porous organo-silicate low-k materials has met a lot of technical challenges. One of the main issues is plasma-induced damage, occurring for all plasma steps involved during interconnects processing. In the present paper, we focus
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d5c084f06f61a104f7392faba3f73db7
https://doi.org/10.1007/s11705-019-1820-5
https://doi.org/10.1007/s11705-019-1820-5
Publikováno v:
Scientific Reports
Scientific Reports, Nature Publishing Group, 2021, 11 (1), pp.357. ⟨10.1038/s41598-020-79560-z⟩
Scientific Reports, Vol 11, Iss 1, Pp 1-10 (2021)
Scientific Reports, Nature Publishing Group, 2021, 11 (1), pp.357. ⟨10.1038/s41598-020-79560-z⟩
Scientific Reports, Vol 11, Iss 1, Pp 1-10 (2021)
Cryogenic Atomic Layer Etching (cryo-ALE) of SiO2 based on alternating a C4F8 molecule physisorption step and an argon plasma step, has been enhanced thanks to a better understanding of the mechanism. First, we used Quadrupole Mass spectrometry (QMS)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2d28eb2e9bd2616f552fcbd8743617a6
https://doi.org/10.1038/s41598-020-79560-z
https://doi.org/10.1038/s41598-020-79560-z
Publikováno v:
MGK Colloquium-Transient Atmospheric Plasmas: from plasmas to liquids to solids
MGK Colloquium-Transient Atmospheric Plasmas: from plasmas to liquids to solids, Apr 2021, Bochum, Germany
HAL
MGK Colloquium-Transient Atmospheric Plasmas: from plasmas to liquids to solids, Apr 2021, Bochum, Germany
HAL
International audience; Micro-plasmas and micro-discharges are low temperature plasmas sources under intensive development over the past two decades[1]. A variety of plasma sources exists involving different geometries and electrical excitation opera
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::519760a624d9c2056015f07e33e196eb
https://hal.archives-ouvertes.fr/hal-03218025
https://hal.archives-ouvertes.fr/hal-03218025
Publikováno v:
Ecole Technologique Du Reseau Des Plasmas Froids
Ecole Technologique Du Reseau Des Plasmas Froids, Sep 2020, Saint-Dié-des-Voges, France
HAL
Ecole Technologique du Reseau des Plasmas Froids
Ecole Technologique du Reseau des Plasmas Froids, Sep 2020, Saint-Dié-des-Voges, France
Ecole Technologique Du Reseau Des Plasmas Froids, Sep 2020, Saint-Dié-des-Voges, France
HAL
Ecole Technologique du Reseau des Plasmas Froids
Ecole Technologique du Reseau des Plasmas Froids, Sep 2020, Saint-Dié-des-Voges, France
National audience; L’émission radiative est un phénomène de transfert d’énergie inhérent aux décharges dans un gaz. Souvent très complexes, les spectres lumineux émis par les plasmas résultent– en théorie – de la manifestation de l
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::2c1d3c490bac90ae5f87f94b5fda344b
https://hal.archives-ouvertes.fr/hal-03049312
https://hal.archives-ouvertes.fr/hal-03049312
Autor:
Christophe Sinturel, Philippe Lefaucheux, Mukesh Kulsreshath, Thomas Tillocher, Mohamed Boufnichel, Marylène Vayer, Alexane Vital, Remi Dussart
Publikováno v:
Micro and Nano Engineering, Vol 1, Iss, Pp 42-48 (2018)
Micro and Nano Engineering
Micro and Nano Engineering, Elsevier, 2018, 1, pp.42-48. ⟨10.1016/j.mne.2018.10.007⟩
Micro and Nano Engineering
Micro and Nano Engineering, Elsevier, 2018, 1, pp.42-48. ⟨10.1016/j.mne.2018.10.007⟩
Cryogenic plasma deep-etching for silicon sub-micron structures was studied with the use of modified poly(styrene) (PS) perforated masks obtained from laterally phase separated PS and poly (lactic acid) PLA blend thin films. PS mask was stained by he
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1d824bc62d8901040ba4ba23a789be11
https://doi.org/10.1016/j.mne.2018.10.007
https://doi.org/10.1016/j.mne.2018.10.007
Autor:
Remi Dussart, R. Chanson, Philippe Lefaucheux, J.-F. de Marneffe, Yu. A. Mankelevich, S. Naumov, S. De Gendt, Liping Zhang, Thomas Tillocher
Publikováno v:
Scientific Reports, Vol 8, Iss 1, Pp 1-12 (2018)
Scientific Reports
Scientific Reports, Nature Publishing Group, 2018, 8 (1), ⟨10.1038/s41598-018-20099-5⟩
Scientific Reports
Scientific Reports, Nature Publishing Group, 2018, 8 (1), ⟨10.1038/s41598-018-20099-5⟩
The micro-capillary condensation of a new high boiling point organic reagent (HBPO), is studied in a periodic mesoporous oxide (PMO) with ∼34 % porosity and k-value ∼2.3. At a partial pressure of 3 mT, the onset of micro-capillary condensation oc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e06b7bdc1c07bdac171bc41fe2513621
http://link.springer.com/article/10.1038/s41598-018-20099-5
http://link.springer.com/article/10.1038/s41598-018-20099-5
Autor:
Mohamed Boufnichel, Remi Dussart, Antoun Gaelle, Jack Nos, Philippe Lefaucheux, Thomas Tillocher
Publikováno v:
Micromachines
Volume 12
Issue 10
Micromachines, Vol 12, Iss 1143, p 1143 (2021)
Micromachines, MDPI, 2021, 12 (10), pp.1143. ⟨10.3390/mi12101143⟩
Volume 12
Issue 10
Micromachines, Vol 12, Iss 1143, p 1143 (2021)
Micromachines, MDPI, 2021, 12 (10), pp.1143. ⟨10.3390/mi12101143⟩
The cryogenic process is well known to etch high aspect ratio features in silicon with smooth sidewalls. A time-multiplexed cryogenic process, called STiGer, was developed in 2006 and patented. Like the Bosch process, it consists in repeating cycles
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5bbcae398cac39608a9e334413ff2963
https://doi.org/10.3390/mi12101143
https://doi.org/10.3390/mi12101143
Publikováno v:
25e Congrès Général de la Société Française de Physique
25e Congrès Général de la Société Française de Physique, Jul 2019, Nantes, France
HAL
25e Congrès Général de la Société Française de Physique, Jul 2019, Nantes, France
HAL
National audience; L’émission radiative est un phénomène de transfert d’énergie inhérent aux décharges dans un gaz. Souvent très complexes, les spectres lumineux émis par les plasmas résultent– en théorie – de la manifestation de l
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::becc59000f979d570b722ef85c52caec
https://hal.archives-ouvertes.fr/hal-02189144
https://hal.archives-ouvertes.fr/hal-02189144
Autor:
P. Lefaucheux, Aurélie Girard, T. Tillocher, S. Tahara, Christophe Cardinaud, G. Antoun, Remi Dussart, Kaoru Maekawa, J. Faguet, K. Yatsuda, K. Yamazaki
Publikováno v:
Japanese Journal of Applied Physics
Japanese Journal of Applied Physics, Japan Society of Applied Physics, 2019, 58 (SE), pp.SEEB03. ⟨10.7567/1347-4065/ab1639⟩
Japanese Journal of Applied Physics, Japan Society of Applied Physics, 2019, 58 (SE), pp.SEEB03. ⟨10.7567/1347-4065/ab1639⟩
International audience
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::78862ff00f94693581891052130ed8be
https://hal.archives-ouvertes.fr/hal-02139391
https://hal.archives-ouvertes.fr/hal-02139391