Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Reinder Teun Plug"'
Autor:
Remco Dirks, Ethan Chiu, Henk Niesing, Baukje Wisse, Stefan Geerte Kruijswijk, Reinder Teun Plug, Bijoy Rajasekharan, Mariya Ponomarenko, Sylvia Yuan, Marlene Strobl, Platt Hung, Noelle Wright, Wilhelm Tsai, Vincent Couraudon, David Huang, Thomas M. Chen, Henry Chen, Paul K. L. Yu, Yi Song, Frida Liang, Andy Lan, Alan Wang, Wilson Hsu, Hugo Augustinus Joseph Cramer
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXVIII.
Integrated metrology in the lithography cluster is a promising solution to tighten process control. It is shown that optical CD metrology using YieldStar, an angular resolved scatterometer, meets all requirements in terms of precision, process robust
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8494e48a6e6ed8de43718353dbe049e0
https://doi.org/10.1117/12.2047205
https://doi.org/10.1117/12.2047205
Autor:
Y. C. Ku, Takuya Mori, Chris de Ruiter, Greet Storms, Guo-Tsai Huang, Jon Wu, Christophe Fouquet, Kelvin Pao, Charlie Chen, Tatung Chow, C. W. Hsieh, Jacky Huang, KS Chen, T. S. Gau, Martijn van Veen, Martijn Maassen, Reinder Teun Plug, Pu Li, Chih-Ming Ke, Arie Jeffrey Den Boef, Paul Christiaan Hinnen, Hua Xu, Maurits van de Schaar, Kai-Hsiung Chen, Youping Zhang, Kaustuve Bhattacharyya, Yi-Yin Chen, Gary Zhang, Eric Verhoeven, Steffen Meyer
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXVIII.
In order to meet current and future node overlay, CD and focus requirements, metrology and process control performance need to be continuously improved. In addition, more complex lithography techniques, such as double patterning, advanced device desi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b4c3afa285f770dc50332f9f9e6e84b3
https://doi.org/10.1117/12.2047098
https://doi.org/10.1117/12.2047098
Autor:
Tom Hoogenboom, Michael Kubis, Martin Ebert, Jos Maas, Arthur Becht, Vidya Vaenkatesan, Hugo Augustinus Joseph Cramer, Stefan Carolus Jacobus Antonius Keij, Reinder Teun Plug, Andreas Fuchs, Kaustuve Bhattacharyya
Publikováno v:
27th European Mask and Lithography Conference.
As leading edge lithography is moving to 2x-nm design rules, lithography control complements resolution as one of the main drivers and enablers to meet the very stringent overlay, focus and CD requirements. As part of ASML's holistic lithography road
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3412a17d13a4842feeeecfcb647d8cec
https://doi.org/10.1117/12.896902
https://doi.org/10.1117/12.896902