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pro vyhledávání: '"Reg Bowley"'
Autor:
Daniel P. Ceperley, Timothy A. Brunner, Reg Bowley, Emily Gallagher, Anne E. McGuire, Masaru Higuchi
Publikováno v:
SPIE Proceedings.
Contact holes represent one of the biggest critical dimension (CD) mask metrology challenges for 45nm technology mask development. The challenge is a consequence of both wafer and mask sensitivities. Large mask error factors and the small process win
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4a4ba25142880dfd841112164191fadc
https://doi.org/10.1117/12.686957
https://doi.org/10.1117/12.686957
