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pro vyhledávání: '"Raymond Robert Ruckel"'
Autor:
Robert P. Rippstein, Raymond Robert Ruckel, John C. Granlund, Alfred E. Palumbo, James M. Oberschmidt, Alek C. Chen
Publikováno v:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II.
X-ray lithography using a synchrotron light source has received considerable attention in recent years as a method for producing semiconductor device dimensions smaller than 0.35 microns. A number of synchrotrons or Electron Storage Rings (ESR) have
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3165d2e891970ac2e4c5f5bc8619eade
https://doi.org/10.1117/12.136017
https://doi.org/10.1117/12.136017
