Zobrazeno 1 - 10
of 230
pro vyhledávání: '"Raymond L. Boxman"'
Publikováno v:
IEEE Transactions on Plasma Science. 50:2709-2713
Thin films were deposited using a vacuum arc with a refractory anode. The arc was sustained between a water cooled Zr cathode and a graphite anode. Both electrodes with diameter 32 mm and 30 mm length, with a gap of 10 mm between them. The distance f
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e57cde903f20789d8477b0e78650b773
https://doi.org/10.1109/tps.2022.3192919
https://doi.org/10.1109/tps.2022.3192919
Publikováno v:
IEEE Transactions on Plasma Science. 47:3484-3487
The hot refractory anode vacuum arc (HRAVA) plasma source was previously developed with a consumed cathode and a refractory anode to reduce the macroparticle (MP) contamination in vacuum arc deposited films. The HRAVA had open cylindrical electrodes
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d4b499a5711684c3bfb0bd60f5d91411
https://doi.org/10.1109/tps.2019.2914996
https://doi.org/10.1109/tps.2019.2914996
Publikováno v:
IEEE Transactions on Plasma Science. 45:2115-2118
The anode in a vacuum arc with a blackbody assembly was measured as a function of time. A 30-mm-diameter Cu cathode and a hollow Ta anode, 50 mm in diameter, were used for a plasma cavity. Cu plasma was ejected through an array of 250 holes of 0.6 mm
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8485107adf15f0dc75fd4557f25ba574
https://doi.org/10.1109/tps.2016.2645863
https://doi.org/10.1109/tps.2016.2645863
Autor:
Isak I. Beilis, Raymond L. Boxman
Publikováno v:
Lecture Notes in Mechanical Engineering ISBN: 9789811361326
Thin film deposition using hot anode vacuum arcs developed in the last decade is described. Two configurations were used: (i) with an open gap—the hot refractory anode vacuum arc (HRAVA) and (ii) with a closed gap—the vacuum arc with black body a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f8edab6197fd7c5d0528862b44b378f5
https://doi.org/10.1007/978-981-13-6133-3_1
https://doi.org/10.1007/978-981-13-6133-3_1
Publikováno v:
Journal of Water Process Engineering. 13:53-60
Pulsed submerged arc (SA) treatment of aqueous methylene blue (MB) solutions was studied in the reactor with multiple mobile iron (Fe) based electrodes. The discharges were carried out between these electrodes, which are repetitively brought into col
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9b0306dd46780020b45160ab2b78117f
https://doi.org/10.1016/j.jwpe.2016.08.002
https://doi.org/10.1016/j.jwpe.2016.08.002
Autor:
Tingwei Hu, Raymond L. Boxman, Paul K. Chu, Cenk Kocer, Marcela M.M. Bilek, Xuming Zhang, M. Jamesh, David R. McKenzie
Publikováno v:
Applied Surface Science. 366:535-544
Graded Ti/C composite films with carbon topcoats are prepared on bendable stainless steel foils by hybrid cathodic arc / glow discharge plasma-assisted chemical vapor deposition to simulate cardiovascular stents. Strong adhesion between the stainless
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::222dace8b346e328b16ef83ef6c2e8ba
https://doi.org/10.1016/j.apsusc.2016.01.121
https://doi.org/10.1016/j.apsusc.2016.01.121
Publikováno v:
2018 28th International Symposium on Discharges and Electrical Insulation in Vacuum (ISDEIV).
Vacuum arcs are used as metallic plasma sources to deposit thin films, but conventional arcs also produce macroparticles (MPs) which degrade film quality. To reduce the MPs, the Hot Refractory Anode Vacuum Arc (HRAVA) plasma source was developed with
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f14e3c878315f8532af3e2b494925635
https://doi.org/10.1109/deiv.2018.8537147
https://doi.org/10.1109/deiv.2018.8537147
Publikováno v:
Corrosion Science. 97:126-138
Hybrid cathodic arc/glow discharge plasma-assisted chemical vapor deposition is used to prepare graded films on Ti and NiTi. XPS reveals the formation of a Ti and carbon graded interface between the substrate and carbon surface layer. The graded film
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7c32f75cbfa7232ae77ae514e6d7aeb3
https://doi.org/10.1016/j.corsci.2015.04.022
https://doi.org/10.1016/j.corsci.2015.04.022
Publikováno v:
IEEE Transactions on Plasma Science. 43:2323-2328
Refractory metal plasma generated by a vacuum arc was used to deposit thin films with different arc currents $I$ . The deposition rate $V_{\rm dep}$ was measured for electrode configurations including a planar Zr cathode and a planar W anode; cylindr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b35c7bcde18bbbbe3826d49b8ed344ce
https://doi.org/10.1109/tps.2015.2432577
https://doi.org/10.1109/tps.2015.2432577
Autor:
Neil J. Nosworthy, Marcela M.M. Bilek, M. Jamesh, David R. McKenzie, Raymond L. Boxman, Paul K. Chu, R. Ganesan, Alexey Kondyurin, Ian Falconer
Publikováno v:
Surface and Coatings Technology. 265:222-234
Graded composite layers containing metal and plasma polymer components were deposited using a cathodic arc in conjunction with plasma immersion ion implantation. Using a bias potential throughout, pure metal was deposited initially using the cathodic
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6f17ed5d12b5ee746b950e7facdd631b
https://doi.org/10.1016/j.surfcoat.2014.11.025
https://doi.org/10.1016/j.surfcoat.2014.11.025