Zobrazeno 1 - 10
of 15
pro vyhledávání: '"Ray Hoobler"'
Publikováno v:
Biophysical Chemistry. 90:9-16
Dihydronicotinamide adenine dinucleotide (NADH), is known to stack in two limiting conformations. Surprisingly, previous experimental work on NADH has not clearly defined whether this folding and unfolding process can be described as first order (inv
Publikováno v:
Journal of Geophysical Research: Planets. 105:15085-15090
Rate coefficients for the reaction C2H + C2H2 → C4H2 + H are measured at 90 and 120 K by using a new pulsed Laval nozzle apparatus equipped with laser ionization, time-of-flight mass spectrometric detection. The C2H radicals are generated by 193 nm
Publikováno v:
Review of Scientific Instruments. 71:1816-1823
A pulsed Laval nozzle, low Mach number supersonic expansion kinetics apparatus has been constructed to study neutral–neutral kinetics by a rather general laser photolysis initiation and laser photoionization detection of the product species. This n
Autor:
Stephen R. Leone, Ray Hoobler
Publikováno v:
The Journal of Physical Chemistry A. 103:1342-1346
Low-temperature rate coefficients for the reactions C2H + C3H4 → products [C3H4 = methylacetylene (propyne) CH3CCH and allene (propadiene) CH2CCH2] are measured over the temperature range of 155−298 K. Absolute rate constants are determined using
Autor:
R. A. Bernheim, Ray Hoobler
Publikováno v:
Physical Review A. 57:1967-1971
Autor:
Ray Hoobler, Stephen R. Leone
Publikováno v:
Journal of Geophysical Research: Planets. 102:28717-28723
Rate coefficients for the reactions of C2H + HCN yields products and C2H + CH3CN yields products have been measured over the temperature range 262-360 K. These experiments represent an ongoing effort to accurately measure reaction rate coefficients o
Publikováno v:
The Journal of Physical Chemistry A. 101:1338-1342
Low-temperature rate coefficients for the reactions of C2H + RH → products (RH = C3H8, i-C4H10, n-C4H10, and neo-C5H12) have been measured over the temperature range 154−361 K. Measurements were ma...
Autor:
Terrence E. Zavecz, Ray Hoobler
Publikováno v:
Optical Microlithography XVIII.
It’s commonly reported that a difference exists between directly measured reticle feature dimensions and those produced in the final lithographic image. Quantifying this mask error function (MEF) and the sources of the perturbation has been the top
Publikováno v:
SPIE Proceedings.
Optical Critical Dimension (OCD) measurements using Normal-Incidence Spectroscopic Polarized Reflectance and Ellipsometry allows for the separation of transverse electric and transverse magnetic modes of light reflected from an anisotropic sample as