Zobrazeno 1 - 10
of 44
pro vyhledávání: '"Ravindra K, Kanjolia"'
Autor:
Mansour Moinpour, Jacob Spiegelman, Michael Breeden, Charles H. Winter, Victor Wang, Ravindra K. Kanjolia, Srinivas D. Nemani, Jacob Woodruff, Steven Wolf, Andrew C. Kummel, Ashay Anurag, Daniel Moser, Keith Tatseun Wong
Publikováno v:
ACS Applied Nano Materials. 4:8447-8454
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6379f6f2e79620f409d4246ee7e47345
https://doi.org/10.1021/acsanm.1c01639
https://doi.org/10.1021/acsanm.1c01639
Autor:
James Edgar Maslar, William A. Kimes, Vladimir B. Khromchenko, Brent A. Sperling, Ravindra K. Kanjolia
Publikováno v:
Journal of Crystal Growth. 607:127102
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a6e02fb4c9f52a437e0d1ab4b7982402
https://doi.org/10.1016/j.jcrysgro.2023.127102
https://doi.org/10.1016/j.jcrysgro.2023.127102
Autor:
Kamesh Mullapudi, Konner E. K. Holden, Jessica L. Peterson, Charles L. Dezelah, Daniel F. Moser, Ravindra K. Kanjolia, Douglas J. Tweet, John F. Conley
Publikováno v:
Journal of Vacuum Science & Technology A. 41:012406
Tungsten oxide–silicon dioxide (WOx–SiOy) composite thin films were deposited for the first time via the remote oxygen plasma-enhanced atomic layer deposition (ALD) process using a novel metal-organic heteronuclear and heteroleptic precursor, bis
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4fe60f720638ecaa1ace12042f05b0b8
https://doi.org/10.1116/6.0002214
https://doi.org/10.1116/6.0002214
Autor:
Charles L. Dezelah, William E. Kaden, Parag Banerjee, Asim Khaniya, Duy Le, Talat S. Rahman, Ravindra K. Kanjolia, Jacob Woodruff, Zhengning Gao
Publikováno v:
Chemistry of Materials. 31:1304-1317
Ruthenium (Ru) films are deposited using atomic layer deposition (ALD), promoted by a self-catalytic reaction mechanism. Using zero-valent, η4-2,3-dimethylbutadiene Ruthenium tricarbonyl (Ru(DMBD)(CO)3) and H2O, Ru films are deposited at a rate of 0
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f9f462918949486ede3223cb16c3a19d
https://doi.org/10.1021/acs.chemmater.8b04456
https://doi.org/10.1021/acs.chemmater.8b04456
Autor:
Berc, Kalanyan, Ryan, Beams, Michael B, Katz, Albert V, Davydov, James E, Maslar, Ravindra K, Kanjolia
Publikováno v:
J Vac Sci Technol A
Potential commercial applications for transition metal dichalcogenide (TMD) semiconductors such as MoS(2) rely on unique material properties that are only accessible at monolayer to few-layer thickness regimes. Therefore, production methods that lend
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::889bb59394b778bc469f8d6589fe680e
https://pubmed.ncbi.nlm.nih.gov/33281278
https://pubmed.ncbi.nlm.nih.gov/33281278
Supplemental material, sj-pdf-1-asp-10.1177_0003702819885182 for Nondispersive Infrared Gas Analyzer for Partial Pressure Measurements of a Tantalum Alkylamide During Vapor Deposition Processes by James E. Maslar, William A. Kimes, Brent A. Sperling
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::609bbd866324b366fef0b63c126d8b40
Autor:
Charles L. Dezelah, L. Fabián Peña, Yves J. Chabal, Joseph P. Klesko, Rezwanur Rahman, Eric C. Mattson, Daniel Moser, Charith E. Nanayakkara, Aaron Dangerfield, Thomas L’Esperance, Ravindra K. Kanjolia
Publikováno v:
Chemistry of Materials. 30:970-981
The need for the conformal deposition of TiO2 thin films in device fabrication has motivated a search for thermally robust titania precursors with noncorrosive byproducts. Alkylamido-cyclopentadienyl precursors are attractive because they are readily
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d00f13adb976ca7a7bfefeffd39cb22c
https://doi.org/10.1021/acs.chemmater.7b04790
https://doi.org/10.1021/acs.chemmater.7b04790
Autor:
Adithi Krishnaprasad, Durjoy Dev, Jeya Prakash Ganesan, Tania Roy, Ravindra K. Kanjolia, Daniel Moser, Parag Banerjee
Publikováno v:
ECS Meeting Abstracts. :879-879
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::be9f57e5213997390e91017abd1d15c7
https://doi.org/10.1149/ma2021-0229879mtgabs
https://doi.org/10.1149/ma2021-0229879mtgabs
Autor:
Ravindra K. Kanjolia, Agnes Derecskei, Xinjian Lei, Ronald Martin Pearlstein, Robert Ridgeway, Rohit Narayanan Kavassery Ramesh, Sumit Agarwal, Xuezhong Jiang, Ryan J. Gasvoda, Haripin Chandra, Bhushan Zope, Wanxing Xu, Guo Liu
Publikováno v:
ECS Meeting Abstracts. :854-854
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5ce029df647a65e7289879efa7cbde53
https://doi.org/10.1149/ma2021-0229854mtgabs
https://doi.org/10.1149/ma2021-0229854mtgabs
Autor:
Daniel Alvarez, Mansour Moinpour, Scott T. Ueda, Jeff Spiegelman, Aaron McLeod, Jacob Woodruff, Andrew C. Kummel, Ravindra K. Kanjolia
Publikováno v:
ECS Meeting Abstracts. :624-624
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e6690c36307e530a64d62bc29838b90f
https://doi.org/10.1149/ma2021-0212624mtgabs
https://doi.org/10.1149/ma2021-0212624mtgabs