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pro vyhledávání: '"Ravi Mullapdi"'
Autor:
David M. Fryauf, Ravi Mullapdi, Nobuhiko P. Kobayashi, Kate J. Norris, Junce Zhang, Amanda Flores, Tana Arunagiri, R. Ernest Demaray, Juan J. Diaz Leon, Lai Lu
Publikováno v:
MRS Proceedings. 1565
We studied physical properties of titanium hafnium oxide (TixHf1-xO2) alloy thin films deposited by pulsed DC reactive magnetron sputtering with AC substrate bias. Thin films of two end oxides, hafnium oxides (HfO2) and titanium oxides (TiO2), and th