Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Raul Beguiristain"'
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment. 347:273-277
A new design method has been developed for a double-element optical system. The method incorporates a very simple ray tracing procedure into an analytic merit function that closely represents the variance of an infinite number of ray-traced spots in
Autor:
Keith Jackson, Raul Beguiristain, Natale M. Ceglio, Khanh Nguyen, Gary E. Sommargren, Masato Koike, James A. Underwood, David Attwood, Jeffrey Bokor
Publikováno v:
Applied optics. 32(34)
Techniques are described for at-wavelength interferometry of multilayer coated optics designed for use in extreme-ultraviolet lithography. Broadly tunable undulator radiation, which covers the spectral region from 45 to 400 A, is described. The coher
Autor:
C. K. Gary, Jay Theodore Cremer, Richard H. Pantell, H. Raul Beguiristain, J. Feinstein, Melvin A. Piestrup
Publikováno v:
Applied optics. 42(4)
A compound refractive lens (CRL), consisting of a series of N closely spaced lens elements each of which contributes a small fraction of the total focusing, can be used to focus x rays or neutrons. The thickness of a CRL can be comparable to its foca
Autor:
Hector Medecki, David Attwood, Edita Tejnil, Kenneth A. Goldberg, Raul Beguiristain, Jeffrey Bokor
Publikováno v:
Optical Fabrication and Testing.
The Center for X-Ray Optics is performing metrology of optics intended to be used for lithography at wavelengths in the Extreme Ultraviolet (EUV) range. The source for this radiation is an undulator operating at the Advanced Light Source (ALS). Initi
Autor:
Kenneth A. Goldberg, Ralph E. Hostetler, Hector Medecki, James P. Spallas, Keith H. Jackson, Jeffrey Bokor, H. Raul Beguiristain, Gary E. Sommargren, David Attwood
Publikováno v:
SPIE Proceedings.
Optical systems for extreme ultraviolet (EUV) lithography require optical elements with wavefront aberrations limited to a fraction of an EUV wavelength to achieve diffraction-limited performance. Achieving wavefront and surface figure metrology at t
Publikováno v:
SPIE Proceedings.
An x-ray microscopy resource center for biological x-ray imaging will be built at the Advanced Light Source (ALS) in Berkeley, California. The unique high brightness of the ALS allows short exposure times and high image quality. Two microscopes, an x
Autor:
Raul Beguiristain
Publikováno v:
Soft X-Ray Projection Lithography.
A long undulator installed at the ALS, a low emittance storage ring, generates quasi-monochromatic beams of high brightness and improved coherence properties that could be used for "at wavelength" interferometry for x-ray projection lithography exper
Autor:
David Attwood, Hector Medecki, Phillip J. Batson, James H. Underwood, Keith H. Jackson, Masato Koike, Seno Rekawa, H. Raul Beguiristain
Publikováno v:
Review of Scientific Instruments. 67:3354-3355
This study analyzes synchrotron radiation heat loading effects on optical components of beamline BL12.0 for EUV interferometry and soft x‐ray microscopy at the Advanced Light Source (ALS). Newly developed indirect side‐cooled beamline optics were
Autor:
J. Theodore Cremer, J. Feinstein, Melvin A. Piestrup, H. Raul Beguiristain, Richard H. Pantell, C. K. Gary
Publikováno v:
Applied Optics. 40:5100
Incoherent x rays in the wavelength interval from approximately 0.5-2 A have been focused with refractive lenses. A single lens would have a long focal length because the refractive index of any material is close to unity; but with a stack of N lens