Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Rattanachai Kowong"'
Autor:
Wuttichai Phae-ngam, Watcharapon Vanidshow, Wantanee Hincheeranun, Tossaporn Lertvanithphol, Chanunthorn Chananonnawathorn, Rattanachai Kowong, Uraiwan Waiwijit, Supphadate Sujinnapram, Jaroenporn Chokboribal, Tanattha Rattana, Mati Horprathum, Weeraya Yuwasonthi
Publikováno v:
Surface Review and Letters. 28
Bimetallic nanostructure of noble metals is an alternative material that can provide the tenability of plasmonic performance. In this study, the plasmonic silver–titanium nanoisland (Ag–Ti NI) films deposited on a silicon wafer and glass slide su
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::520cad571cb7127908ff8bf2a09bc5fc
https://doi.org/10.1142/s0218625x21501237
https://doi.org/10.1142/s0218625x21501237
Autor:
Tossaporn Lertvanithphol, Sutatip Thonglem, Rattanachai Kowong, Chanunthorn Chananonnawathorn, Nat Waikhamnuan, Mati Horprathum, Wuttichai Phae-ngam, Sainampeung Meksuk
Publikováno v:
Materials Today: Proceedings. 47:3468-3470
Crystalline hafnium nitride (HfN) thin films were successfully prepared by direct current (DC) reactive magnetron sputtering on a silicon substrate at room temperature. The effects of deposition time on physical structure, morphological, film composi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e9ea90e0fa4277894200792da1330f19
https://doi.org/10.1016/j.matpr.2021.03.462
https://doi.org/10.1016/j.matpr.2021.03.462
Akademický článek
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Autor:
Chakkaphan Wattanawikkam, Atipong Bootchanont, Porramain Porjai, Chanthawut Jetjamnong, Rattanachai Kowong, Tossaporn Lertvanithphol, Chanunthorn Chananonnawathorn, Prae Chirawatkul, Narong Chanlek, Hideki Nakajima, Prayoon Songsiriritthigul, Nuanlaor Kiama, Watcharapong Nareejun, Praewnapa Tomkham, Chatchai Ponchio, Sakon Rahong, Annop Klamchuen, Mati Horprathum
Publikováno v:
Applied Surface Science. 584:152581
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2c75de3270467398fd75e15737d46c4e
https://doi.org/10.1016/j.apsusc.2022.152581
https://doi.org/10.1016/j.apsusc.2022.152581
Autor:
Mati Horprathum, Anucha Watcharapasorn, Saksorn Limwichean, S. Chotikaprakhan, P. Kijamnajsuk, Chanthawut Jetjamnong, Tossaporn Lertvanithphol, Hideki Nakajima, Atipong Bootchanont, Rattanachai Kowong, Annop Klamchuen, Chanunthorn Chananonnawathorn, Gang Meng
Publikováno v:
Vacuum. 196:110777
In this work, the reactive magnetron co-sputtering with oblique angle deposition (OAD) was used for preparing NiWO nanorod films. The influence of the sputtering power of Ni target on the microstructural, morphology, and chemical composition of the N
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a1cf7ccc31e6ef24e5cc0d7c2d651a81
https://doi.org/10.1016/j.vacuum.2021.110777
https://doi.org/10.1016/j.vacuum.2021.110777
Autor:
Mati Horprathum, Tossaporn Lertvanithphol, Wuttichai Phae-ngam, Hideki Nakajima, Chanunthorn Chananonnawathorn, Rattanachai Kowong, Pennapa Muthitamongkol, Somyod Denchitcharoen, Narit Triamnak, Kata Jaruwongrungsee, Annop Klamchuen, Prayoon Songsiriritthigul
Publikováno v:
Journal of Alloys and Compounds. 886:161265
In this work, we systematically investigated the Zr-W-Ti nanostructured metallic glasses (NMGs) thin films on silicon (Si) wafer substrate fabricated via multitarget co-sputtering with oblique angle deposition (OAD) technique. By varying the substrat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d06595da529063ccf28086a78aceca80
https://doi.org/10.1016/j.jallcom.2021.161265
https://doi.org/10.1016/j.jallcom.2021.161265
Autor:
Narathon Khemasiri, Darinee Phromyothin, Rattanachai Kowong, Supanit Pornthreeraphat, Sirajit Vuttivong, Chanonthorn Chananonnawathorn, Mati Horphathum, Sukittaya Jessadaluk, Poosuda Phatban
Publikováno v:
Materials Today: Proceedings. 4:6326-6330
Here, we illustrate the growth of ZnO-NRs through low temperature hydrothermal process on ZnO thin film seed layer. Indium Tin Oxide (ITO) is selected to be substrate material for all experimental condition. The crucial parameters in the growth proce
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f37c4e82090434d4def2c4209a3f801d
https://doi.org/10.1016/j.matpr.2017.06.134
https://doi.org/10.1016/j.matpr.2017.06.134
Publikováno v:
SPIE Proceedings.
The Arc Discharge Drawing (ADD) technique offers a promising alternative for fabricating silica nanowires. In the previous study, ADD technique was based on the creation of a high voltage glow discharge between two electrodes. Such a configuration pr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::531a99587b24e8a13ff63843b7740bc5
https://doi.org/10.1117/12.2196127
https://doi.org/10.1117/12.2196127