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Mechanistic Studies of the Acidolysis Reactions Occurring in Silicon-Containing Bilayer Photoresists
Autor:
Gregory M. Wallraff, Mark H. Sherwood, Ilya Zharov, Gregory Breyta, Carl E. Larson, Ratnam Sooriyakamaran, Richard Anthony DiPietro, Josef Michl
Publikováno v:
Chemistry of Materials. 14:656-663
As the feature sizes of semiconductor devices continue to shrink, there is an increasing interest in thin film imaging approaches such as silicon-based bilayer resists. We have developed such a res...
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6543c21b1031ac2fa359c58ad249d844
https://doi.org/10.1021/cm010660i
https://doi.org/10.1021/cm010660i
