Applications of Control to Semiconductor Manufacturing: Reactive Ion Etching.

Autor: Elta, M., Etemad, H., Freudenberg, J. S., Giles, M. D., Grizzle, J. W., Kabamba, P. T., Khargonekar, P. P., Lafortune, S., Meerkov, S. M., Moyne, J. R., Rashap, B. A., Teneketzis, D., Terry, F. L.

Publikováno v: 1993 American Control Conference; 1993, p2990-2997, 8p

Sensor systems for real-time feedback control of reactive ion etching.

Autor: Benson, T. E., Kamlet, L. I., Ruegsegger, S. M., Hanish, C. K., Hanish, P. D., Rashap, B. A., Klimecky, P., Freudenberg, J. S., Grizzle, J. W., Khargonekar, P. P., Terry, F. L., Barney, Bryan

Publikováno v: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1996, Vol. 14 Issue 1, p483-488, 6p

Applications of control to semiconductor manufacturing: Reactive ion etching

Autor: Elta, M., Etemad, H., Freudenberg, J. S., Giles, M. D., Grizzle, J. W., Kabamba, P. T., Pramod Khargonekar, Lafortune, S., Meerkov, S. M., Moyne, J. R., Rashap, B. A., Teneketzis, D., Terry Jr, F. L.

Publikováno v: Scopus-Elsevier

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::9d3f1a8f624bbd580729d16dc2b566f9
http://www.scopus.com/inward/record.url?eid=2-s2.0-0027335097&partnerID=MN8TOARS

THE PATHOGENESIS OF JACKSONIAN EPILEPSY.

Autor: Rashap, B., Fesenko, F., Shtchepkovskaya, E. V.

Publikováno v: Journal of Nervous & Mental Disease; Dec1941, Vol. 94 Issue 6, p760-760, 1p