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pro vyhledávání: '"Rashad Filfilan"'
Autor:
Rashad Filfilan, Maha M. Khayyat
Publikováno v:
American Journal of Nanosciences. 7:42
Ultra High Vacuum Chemical Vapor Deposition (UHVCVD) reactor has been used to grow silicon nanowires via innovative economical approaches using chemical active materials as catalysts such as aluminum. Scanning Electron Microscopy has been used to stu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f843e46be61bdb330310a9b1a42c8db1
https://doi.org/10.11648/j.ajn.20210702.12
https://doi.org/10.11648/j.ajn.20210702.12
