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pro vyhledávání: '"Raphaël Cozzolino"'
Publikováno v:
Surface and Coatings Technology. 205:S198-S203
Thin films are deposited in a multipolar microwave plasma reactor excited by distributed electron cyclotron resonance (MMP–DECR) using Zirconium Tert-Butoxide (ZTB) as precursor and characterized in function of two process parameters: microwave pow
Publikováno v:
The European Physical Journal Applied Physics. 73:20801
Dielectric barrier discharge (DBD) deposition of thin films is increasingly studied as a promising alternative to other non-thermal processes such as low-pressure plasma-enhanced chemical vapor deposition (PECVD) or wet-coating. In this paper we demo