Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Ran Alkoken"'
Autor:
Woosung Jung, Jong-Hoi Cho, SungHun Lim, TaeSeop Lee, DaeYoung Choi, Jong-Hyun Seo, SeungHyun Lee, JunKyoung Lee, You Jin Kim, Jeong Ho Yeo, Alex Brikker, Roi Meir, Ran Alkoken, Kyeongju Han, Sujin Lim, KyungJae Choi, Chanhee Kwak, Hyeon Sang Shin
Publikováno v:
Metrology, Inspection, and Process Control XXXVII.
Autor:
Woosung Jung, Jong-Hoi Cho, SungHun Lim, TaeSeop Lee, DaeYoung Choi, Jong-Hyun Seo, SeungHyun Lee, JunKyoung Lee, You Jin Kim, Jeong Ho Yeo, Alex Brikker, Roi Meir, Ran Alkoken, Kyeongju Han, Sujin Lim, KyungJae Choi, Chanhee Kwak, Hyeon Sang Shin
Publikováno v:
Metrology, Inspection, and Process Control XXXVII.
Autor:
Bobin Mathew, Shahar Arad, Omri Brand, Tal Frank, Ran Alkoken, Yael Shilo, Yarden Melamed, Rotem M. Yosef, Hyo Seon Suh, Seonggil Heo, Sandip Halder
Publikováno v:
Metrology, Inspection, and Process Control XXXVII.
Autor:
Elad Sommer, Ran Alkoken, Tal Bar-On, Liraz Gershtein, Svetlana Pastur, Roman Kris, Hiroshi Miroku, Efrat Noifeld, I Horikawa, Ishai Schwarzband, Olga Novak, Grigory Klebanov, Sharon Duvdevani-bar, Dhananjay Singh Rathore, Bobin Mathew, Shimon Levy
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXIII.
The growing demand for advanced DRAM technologies requires development of novel process control methodologies reflecting design rule shrinkage. The new challenges for CD SEM metrology of dense feature arrays of DRAM layers are widely considered in th