Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Ramsey Hazbun"'
Silicon epitaxy using tetrasilane at low temperatures in ultra-high vacuum chemical vapor deposition
Autor:
James Kolodzey, John Hart, Stefan Zollner, Thomas N. Adam, Ryan Hickey, Ramsey Hazbun, Ayana Ghosh, Nalin Fernando
Publikováno v:
Journal of Crystal Growth. 444:21-27
The deposition of silicon using tetrasilane as a vapor precursor is described for an ultra-high vacuum chemical vapor deposition tool. The growth rates and morphology of the Si epitaxial layers over a range of temperatures and pressures are presented
Autor:
James Kolodzey, John Hart, Stefan Zollner, Ramsey Hazbun, David J. Eldridge, Ryan Hickey, Nalin Fernando, Thomas N. Adam
Publikováno v:
Thin Solid Films. 604:23-27
Tetrasilane and digermane were used to grow epitaxial silicon germanium layers on silicon substrates in a commercial ultra-high vacuum chemical vapor deposition tool. Films with concentrations up to 19% germanium were grown at temperatures from 400
Autor:
H. Hier, Keith W. Goossen, Ayub Fathimulla, Leye Aina, Nupur Bhargava, Victor A. Rodriguez-Toro, James Kolodzey, Ramsey Hazbun, L. Ramdas Ram-Mohan
Publikováno v:
Infrared Physics & Technology. 69:211-217
The addition of nitrogen to III–V alloys has been widely studied as a method of modifying the band gap for mid-infrared (IR) applications. Lattice matching these alloys to convenient substrates such as GaSb, however, is challenging due to the signi
Autor:
James Kolodzey, Ramsey Hazbun, James Nakos, Dean Siegel, John Hart, D. L. Harame, Christopher J. Funch
Publikováno v:
ECS Transactions. 64:659-667
The Ge content in SiGe bipolar transistors (HBTs) has been steadily increasing for the past few decades in order to meet higher frequency targets. Problems exist with higher Ge content films due to the strain from the pseudomorphic growth on Si subst
Publikováno v:
2016 IEEE Photonics Society Summer Topical Meeting Series (SUM).
Germanium-tin is an emerging optoelectronic material, but its device properties are not yet well understood. To evaluate the feasibility of GeSn-based p-n junction diodes for device and circuit applications, layers of doped GeSn with Sn contents up t
Autor:
Nalin Fernando, John Hart, Stefan Zollner, Ramsey Hazbun, Ryan Hickey, Dainan Zhang, James Kolodzey
Publikováno v:
2016 IEEE Photonics Society Summer Topical Meeting Series (SUM).
Ge is an indirect band gap material. The band structure of Ge is a strong function of strain and alloy composition, and a transition from an indirect to a direct band gap has been observed for y∼6–10% for relaxed Ge 1_y Sn y indicating the possib
Autor:
Ramsey Hazbun, James N. Hilfiker, Ryan Hickey, John Hart, James Kolodzey, Stefan Zollner, Stefan Schoeche, Rigo A. Carrasco, Nalin Fernando
Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 36:021202
The authors report the compositional dependence of the direct and indirect band gaps of pseudomorphic Ge1−x−ySixSny alloys on Ge and GaAs with (001) surface orientation determined from deformation potential theory and spectroscopic ellipsometry m
Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 35:021205
Epitaxial layers of Ge1−xSnx with Sn compositions up to 18.5% were grown on Ge (100) substrates via solid-source molecular beam epitaxy. Crystallographic information was determined by high resolution x-ray diffraction, and composition was verified
Autor:
Yi-Chiau Huang, Yihwan Kim, Ramsey Hazbun, Thomas N. Adam, John Hart, James Kolodzey, Alexander Reznicek, Jay Gupta
Publikováno v:
Journal of Applied Physics. 119:093105
Pseudomorphic GeSn layers with Sn atomic percentages between 4.5% and 11.3% were grown by chemical vapor deposition using digermane and SnCl4 precursors on Ge virtual substrates grown on Si. The layers were characterized by x-ray diffraction rocking
Autor:
V. Kaushal, James Nakos, Dean Siegel, James Kolodzey, Ramsey Hazbun, Christopher J. Funch, John Hart, David Scott Hazel
Publikováno v:
ECS Meeting Abstracts. :1805-1805
Si and SiGe epitaxy via UHVCVD requires an extremely clean and oxide free substrate but has the advantage of allowing low temperature epitaxy (LTE). In-situ bake-off of thin native oxides is possible at high temperatures, but is not an option for low