Zobrazeno 1 - 10 of 23 pro vyhledávání: '"Ramil-Marcelo L. Mercado"'
1
Investigation of Zinc Dimercaptothiadiazole as a Corrosion Inhibitor for Steel
Autor: Chris E. Miller, Michael B. Kiely, Ramil Marcelo L. Mercado, Diane Buhrmaster, Peter Zarras, Jonathan Fury
Publikováno v: ECS Transactions. 50:345-354
The mechanism of corrosion inhibition of zinc dithiomercaptothiadiazole (Zn(DMcT)2) has been known and elucidated. The efficacy of (Zn(DMcT)2) as used in primer coatings for corrosion inhibition on steel alloys such as 1010 steel and 4130 high streng
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b5cbedb9dcae9470ce71c9d759213814
https://doi.org/10.1149/05031.0345ecst
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2
Simulation and Experimental Study on Multilayer Double-Patterning Processes
Autor: Douglas J. Guerrero, Zhimin Zhu, Ramil-Marcelo L. Mercado, Daniel M. Sullivan
Publikováno v: ECS Transactions. 27:473-478
The imaging constraints imposed by the optics of current lithographic tools now require double-patterning (DP) processes. As lithography pushes past 32-nm resolution, the need to optimize material stacks, including resist, bottom anti-reflective coat
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::4d108d2df86bd6931d153ea987227fda
https://doi.org/10.1149/1.3360662
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4
Organic Monolayer Determination on Semiconductor Substrates
Autor: Ramil-Marcelo L. Mercado, Douglas J. Guerrero, Joyce Lowes
Publikováno v: Journal of Photopolymer Science and Technology. 20:339-343
Organic materials are routinely coated on semiconductor substrates for various photolithographic processes. The cleanliness of a substrate after being coated with a bottom anti-reflective coating (BARC), photoresist, or both was studied using contact
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::4ab305ff5c9cbf35ea64789f924dcfca
https://doi.org/10.2494/photopolymer.20.339
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5
Synthesis of (Silylamino)Phospholenes and their Derivatives: Synthesis of a New Spirocyclic Phosphazene
Autor: Ramil-Marcelo L. Mercado, Hongming Zhang, Patty Wisian-Neilson, Cuiping Zhang
Phospholenes containing one or two methyl groups at the 3 and 4 positions on the heterocyclic ring and bis(trimethylsilyl)amino groups on phosphorus were prepared by treating 1-bromo or 1-chlorophospholenes with lithium bis(trimethylsilyl)amide. Seve
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::cbd82b7226c9f0143a92b86d01507ee3
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6
Photochemical Studies on Bottom Anti-Reflective Coatings
Autor: Ramil-Marcelo L. Mercado, Carlton Washburn, Douglas J. Guerrero, Jim D. Meador
Publikováno v: Journal of Photopolymer Science and Technology. 19:343-347
The photochemical behavior of 193-nm photosensitive bottom anti-reflective coatings (BARCs) were studied. The effects of exposure dose, post-exposure bake (PEB) temperature, PAG size, and BARC thickness on contrast and the decrosslinking process was
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::bd6afc335cd19590caf456b4ae960ebf
https://doi.org/10.2494/photopolymer.19.343
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7
Synthesis and Structure of Cyclic Zwitterionic Silicates. Formation via Si−N Donor Interaction1
Autor: Ramil-Marcelo L. Mercado, A. Chandrasekaran, Robert R. Holmes, Roberta O. Day
Publikováno v: Organometallics. 18:1686-1692
New silanes, [C6H4(CH2)NMe2](C6H4O2)SiPh (1) and [C6H4(CH2)NMe2]2Si(OCH2CH3)2 (2), and new bicyclic zwitterionic silicates, [C6H4(CH2)NMe2H](C6H4O2)2Si (3), [C6H4(CH2)NMe2H](C6H3O2F)2Si (4), [C6H4(CH2)NMe2H](C10H6O2)2Si·C6H5CH3 (5), and [C6H4(CH2)NM
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::fbb537f9a2d8ce91148c8d8cea31fd74
https://doi.org/10.1021/om9808413
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8
Pentacoordinated Organo and Hydrido Cyclic Silanes via Sulfur Donor Action1
Autor: Ramil-Marcelo L. Mercado, Roberta O. Day, Robert R. Holmes, A. Chandrasekaran
Publikováno v: Organometallics. 18:906-914
The new cyclic organosilanes S(C10H6O)2SiMe2 (1) and S(C10H6O)2SiPh2 (2) were obtained by the reaction of R2Si(NMe2)2 (R = Me, Ph) with thiobis(2,2‘-naphthol), while S[Me2C6H2O]2SiH(Me) (3) and S[(t-Bu)MeC6H2O]2SiH(Me) (4) were formed by reaction o
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::a5d82738187189ba398e24aa3275629a
https://doi.org/10.1021/om980751y
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9
Advantages of BARC and photoresist matching for 193-nm photosensitive BARC applications
Autor: Mark Slezak, Ramil-Marcelo L. Mercado, Joyce Lowes, Jim D. Meador, Charlyn Stroud, Victor Pham, Ferdinand Rosas
Publikováno v: SPIE Proceedings.
As the semiconductor industry approaches smaller and smaller features, applications that previously used top antireflective coatings have now begun using developer-soluble bottom anti-reflective coatings (BARCs). However, there are several drawbacks
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::045fefa0eae896151739ffc4b46fe40c
https://doi.org/10.1117/12.846608
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10
Photoresist-induced development behavior in DBARCs
Autor: Brandy Carr, Charlyn Stroud, Carlton Washburn, Jim D. Meador, Anwei Qin, Joyce Lowes, Ramil-Marcelo L. Mercado, Alice Guerrero
Publikováno v: SPIE Proceedings.
Developer-soluble bottom anti-reflective coating (DBARC) BSI.W09008 has provided promising lithography results with five different 193-nm photoresists, with the accomplishments including 120-nm L/S (1:1) and 130-nm L/S through-pitch (i.e., 1:1, 1:3,
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::c588b6f98644bb90ef13d9206f213648
https://doi.org/10.1117/12.846927
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