Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Rambert K. Nahm"'
Publikováno v:
Journal of Vacuum Science & Technology A. 40:012201
We have examined the nucleation and growth of WSe2 thin films in ultrahigh vacuum on highly oriented pyrolytic graphite (HOPG) using in situ real-time x-ray fluorescence (XRF), and ex situ x-ray diffraction, x-ray photoelectron spectroscopy, scanning
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::54953020a9bd9b1294c9f07c5ae39b02
https://doi.org/10.1116/6.0001407
https://doi.org/10.1116/6.0001407
Publikováno v:
The Journal of Physical Chemistry C. 121:8464-8472
We have examined the effect of growth rate on the growth mode of thin films of tetracene on SiO2 at a substrate temperature of 0 °C. For a preponderance of conditions examined here, only the thin-film phase is formed. From a combination of in situ r
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::87ed468571075d14ec01b8c6719c7570
https://doi.org/10.1021/acs.jpcc.7b01369
https://doi.org/10.1021/acs.jpcc.7b01369
Autor:
Rambert K. Nahm, James R. Engstrom
Publikováno v:
The Journal of Physical Chemistry C. 120:7183-7191
We have examined the growth of thin films of tetracene on SiO2 using in situ real time X-ray synchrotron radiation and ex situ atomic force microscopy. Using in situ X-ray reflectivity, we observe a transition from 3D island growth to 2D layer-by-lay
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2ea1b1b90e0f038ba3ed4391f71a7c7c
https://doi.org/10.1021/acs.jpcc.6b00963
https://doi.org/10.1021/acs.jpcc.6b00963
Publikováno v:
The Journal of Physical Chemistry C. 120:6165-6179
We have examined the growth of bilayers and superlattices of pentacene and perylene derivatives (PTCDI-Cn) using in situ real time X-ray synchrotron radiation techniques and ex situ atomic force microscopy. We find that the growth of PTCDI-Cn layers
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1ce927ac0e69e37fba4acef4ec889674
https://doi.org/10.1021/acs.jpcc.6b01717
https://doi.org/10.1021/acs.jpcc.6b01717
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 35:061604
The authors report the design and characterization of a microreactor probe that enables gas-phase reactions such as atomic layer deposition (ALD) at low-to-medium vacuum, which is coupled directly to an ultrahigh vacuum (UHV) analysis chamber for sub
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cfa144cf72f261068e6616ff8867c4ab
https://doi.org/10.1116/1.4996553
https://doi.org/10.1116/1.4996553
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 31:061101
The authors have examined ultrathin (≤10 A) tantalum nitride (TaNx) thin films deposited by atomic layer deposition (ALD) on three surfaces relevant to interconnect layers in microelectronic devices: thermally grown SiO2; a Cu thin film grown by ph
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7a88d714754e6c0fcda75fb91dcb0066
https://doi.org/10.1116/1.4812695
https://doi.org/10.1116/1.4812695
Publikováno v:
ECS Meeting Abstracts. :1942-1942
not Available.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::01e916a64efb6e78dae2dff4b5724421
https://doi.org/10.1149/ma2011-02/28/1942
https://doi.org/10.1149/ma2011-02/28/1942
Publikováno v:
Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Jan2022, Vol. 40 Issue 1, p1-18, 18p
Publikováno v:
Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Nov2013, Vol. 31 Issue 6, p061101, 11p