Zobrazeno 1 - 10
of 11
pro vyhledávání: '"Ramaswamy Sreenivasan"'
Autor:
David M. Hoganson, Joseph P. Vacanti, Thomas M. Cervantes, Erik K. Bassett, Ramaswamy Sreenivasan, Karen K. Gleason
Publikováno v:
Microfluidics and Nanofluidics. 12:835-839
A versatile solvent-free method for surface modification of various materials including both metals and polymers is described. Strong irreversible bonds were formed when substrates modified by initiated chemical vapor deposition (iCVD) of poly(1,3,5-
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::194f9fa70a540e8a4cf2b0beef726a01
https://doi.org/10.1007/s10404-011-0913-3
https://doi.org/10.1007/s10404-011-0913-3
Ultra-thin, gas permeable free-standing and composite membranes for microfluidic lung assist devices
Autor:
Ramaswamy Sreenivasan, David M. Hoganson, Joseph P. Vacanti, Erik K. Bassett, Karen K. Gleason
Publikováno v:
Biomaterials. 32:3883-3889
Membranes for a lung assist device must permit the exchange of gaseous O₂ and CO₂ while simultaneously acting as a liquid barrier, so as to prevent leakage of blood and its components from passing from one side to the other. Additionally, these m
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0b8002495cf3a394029b761bee057bd5
https://doi.org/10.1016/j.biomaterials.2011.02.017
https://doi.org/10.1016/j.biomaterials.2011.02.017
Autor:
Sreeram Vaddiraju, Salmaan H. Baxamusa, Nathan J. Trujillo, Gozde Ozaydin-Ince, Jingjing Xu, Karen K. Gleason, Mahriah E. Alf, Ramaswamy Sreenivasan, Christy D. Petruczok, Miles C. Barr, Ayse Asatekin, Wyatt E. Tenhaeff, Hitesh Chelawat
Publikováno v:
Advanced Materials. 22:1993-2027
Chemical vapor deposition (CVD) polymerization utilizes the delivery of vapor-phase monomers to form chemically well-defined polymeric films directly on the surface of a substrate. CVD polymers are desirable as conformal surface modification layers e
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1d8b34d070416179668d21a9e2ae29ae
https://doi.org/10.1002/adma.200902765
https://doi.org/10.1002/adma.200902765
Publikováno v:
Chemical Vapor Deposition. 15:77-90
Vapor based polymer deposition methods have evolved to address the limitations of solution polymerization. However this field of vapor based polymerization suffers from varied nomenclature and would benefit from a review article that brought together
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fd6c182fe2933085091780874ce638ef
https://doi.org/10.1002/cvde.200800040
https://doi.org/10.1002/cvde.200800040
Publikováno v:
Journal of Crystal Growth. 310:270-283
Segmented CVD reactor designs enabling spatial control of across-wafer gas phase composition were evaluated for depositing graded films suitable for combinatorial studies. Specifically, two reactor designs were constructed and evaluated with experime
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7216899468e93dfcc4e8cc3c2884643c
https://doi.org/10.1016/j.jcrysgro.2007.10.041
https://doi.org/10.1016/j.jcrysgro.2007.10.041
Autor:
Y. Xu, Laurent Henn-Lecordier, Ramaswamy Sreenivasan, John N. Kidder, E. Zafiriou, Gary W. Rubloff, Theodosia Gougousi
Publikováno v:
AIP Conference Proceedings.
A 300 amu closed-ion-source RGA (Leybold-Inficon Transpector 2) sampling gases directly from the reactor of an ULVAC ERA-1000 cluster tool has been used for real time process monitoring of a W CVD process. The process involves H2 reduction of WF6 at
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e70cc29b463d6e9ac38c8764fd127fcc
https://doi.org/10.1063/1.1354406
https://doi.org/10.1063/1.1354406
Publikováno v:
Proceedings of the 2000 American Control Conference. ACC (IEEE Cat. No.00CH36334).
We have developed a series of interactive control education modules. They are intended to be useful to a broad audience of students as well as practitioners. Their main objective is to provide insight and intuition rather than precise mathematics.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3c131cb7766f1fa285483e2aa8c039da
https://doi.org/10.1109/acc.2000.879211
https://doi.org/10.1109/acc.2000.879211
Publikováno v:
Proceedings of the 1999 American Control Conference (Cat. No. 99CH36251).
We are developing six control engineering design modules for use by graduate students, advanced undergraduates, and practicing engineers in learning about process control. This is part of a larger project investigating the use of dynamic simulation a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b3120ed7ca3079337f93e056c3f6727d
https://doi.org/10.1109/acc.1999.782875
https://doi.org/10.1109/acc.1999.782875
Autor:
Yuhong Cai, Raymond A. Adomaitis, Gary W. Rubloff, Ramaswamy Sreenivasan, Laurent Henn-Lecordier, Jae-ouk Choo
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 25:1288
Mass spectrometry has proven valuable in understanding and controlling chemical processes used in semiconductor fabrication. Given the complexity of spatial distributions of fluid flow, thermal, and chemical parameters in such processes, multipoint c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::68bd1d18e11b8ae436eb9caf3e131972
https://doi.org/10.1116/1.2753851
https://doi.org/10.1116/1.2753851
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 24:2706
A new chemical vapor deposition (CVD) reactor design was developed to intentionally induce spatially nonuniform film thickness deposition patterns on a single wafer. A segmented showerhead design allows individual regions of a wafer to be exposed to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8b6f956571377e18d1c807a0122ad4f7
https://doi.org/10.1116/1.2359735
https://doi.org/10.1116/1.2359735