Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Ralf Neubauer"'
Publikováno v:
Beton- und Stahlbetonbau. 103:262-270
Das Bauvorhaben Limbecker Platz stellt sowohl im Umfang als auch in Komplexitat einen neuen Hohepunkt im Bau von innerstadtischen Einkaufszentren dar. Das Bauvorhaben umfasst einen Umfang von mehr als 200.000 m2 BGF und entsteht auf dem alten Standor
Publikováno v:
The Journal of Chemical Physics. 119:1710-1718
Temperature-programmed x-ray photoelectron spectroscopy was used to study the thermal chemistry of acetylene (C2H2) and ethylene (C2H4) on Ni(100) in the temperature range 90–530 K. The use of a third generation synchrotron light source facilitated
Publikováno v:
Surface Review and Letters. :789-795
We present a temperature-programmed X-ray photoelectron spectroscopy study of the thermal chemistry of acetylene, ethylene and propene on Ni(100) using synchrotron radiation. The use of a third generation light source makes it possible to measure hig
Publikováno v:
The Journal of Chemical Physics. 115:8133-8140
Using synchrotron radiation, the adsorption and decomposition of propene (C3H6) on the Ni(100) surface has been investigated in situ by time-resolved and temperature-programmed x-ray photoelectron spectroscopy. At 105 K, high-resolution C 1s spectra
Autor:
Nicolo Morgana, Roderick Koehle, Ralph Schlief, Mario Hennig, Christoph Noelscher, Ralf Neubauer, Thomas Henkel, Molela Moukara, Franck Jauzion-Graverolle
Publikováno v:
Optical Microlithography XXI.
To avoid expensive immersion lithography and to further use existing dry tools for critical contact layer lithography at 4Xnm DRAM nodes the application of altPSM is investigated and compared to attPSM. Simulations and experiments with several test m
Autor:
Karsten Bubke, Ralf Neubauer, Rainer Pforr, Jens Reichelt, Ralf Ziebold, K. T. Park, Martin Sczyrba
Publikováno v:
SPIE Proceedings.
Chromeless Phase Lithography (CPL) is discussed as interesting option for the 65nm node and beyond offering high resolution and small Mask Error Enhancement Factor. However, it was shown recently that at high NA CPL masks can exhibit large polarizati
Publikováno v:
SPIE Proceedings.
Alternating Phase-Shifting masks (altPSM) are known to provide high contrast imaging combined with a low Mask Error Enhancement Factor (MEEF) at low k1. At feature sizes close to 60nm half-pitch and less the impact of mask topography effects increase
Publikováno v:
Volume 1: Fora, Parts A, B, C, and D.
The vortex instability in a spherical pipe trifurcation is investigated by applying a Very Large Eddy Simulation (VLES). For this approach an new adaptive turbulence model based on an extended version of the k-e model is used. Applying a classical Re
Publikováno v:
Annalen der Physik. 490:185-206
Ausgehend von der exakten Losung der Bewegungsgleichung des Zwei-Spin-Systems (ZSS) bei kontinuierlicher HF-Einstrahlung werden die zeitlichen Mittelwerte und das dynamische Verhalten ausfuhrlich diskutiert und mit Festkorpertheorien der NMR verglich