Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Ralf Kops"'
Autor:
Klaus Bergmann, B Santos, Alexander von Wezyk, Takahiro Shirai, Daiki Yamatani, Yusuke Teramoto, Noritaka Ashizawa, Kunihiko Kasama, Akihisa Nagano, Yuta Taniguchi, Margarete Kops, Ralf Kops, Hironobu Yabuta, Guido Mertens
Publikováno v:
Extreme Ultraviolet (EUV) Lithography VIII.
High-throughput actinic mask inspection tools are needed as EUVL begins to enter into volume production phase. One of the key technologies to realize such inspection tools is a high-radiance EUV source of which radiance is supposed to be as high as 1
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9bbb558fd368c033c8c0b2a97c09632e
https://doi.org/10.1117/12.2258139
https://doi.org/10.1117/12.2258139
Autor:
Alexander von Wezyk, Guido Mertens, Klaus Bergmann, Takahiro Shirai, Kiyotada Nakamura, Hironobu Yabuta, Akihisa Nagano, Yusuke Teramoto, Ralf Kops, Kazuya Aoki, Kunihiko Kasama, Margarete Kops, Noritaka Ashizawa, Yuta Taniguchi, B Santos
Publikováno v:
Extreme Ultraviolet (EUV) Lithography VII.
High-throughput and -resolution actinic mask inspection tools are needed as EUVL begins to enter into volume production phase. To realize such inspection tools, a high-radiance EUV source is necessary. Ushio’s laser-assisted discharge-produced plas
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f3d959e75a09d6cba0cb2d6147991256
https://doi.org/10.1117/12.2219219
https://doi.org/10.1117/12.2219219
Autor:
Margarete Kops, Guido Mertens, Yuta Taniguchi, Alexander von Wezyk, Takahiro Shirai, Noritaka Ashizawa, Klaus Bergmann, Yusuke Teramoto, Kunihiko Kasama, Ralf Kops, Hironobu Yabuta, B Santos, Akihisa Nagano
Publikováno v:
High-Brightness Sources and Light-Driven Interactions.
A compact high-brightness EUV source is needed for high-throughput actinic mask inspection in EUV lithography. Ushio is developing a light source utilizing LDP technology where rotating Sn-covered electrodes, trigger lasers and pulsed electrical disc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::59fd94ddf902a20377f40c9c844cca15
https://doi.org/10.1364/euvxray.2016.es4a.1
https://doi.org/10.1364/euvxray.2016.es4a.1
Autor:
Yusuke Teramoto, Bárbara Santos, Guido Mertens, Ralf Kops, Margarete Kops, Alexander von Wezyk, Hironobu Yabuta, Akihisa Nagano, Takahiro Shirai, Noritaka Ashizawa, Kiyotada Nakamura, Kunihiko Kasama
Publikováno v:
SPIE Proceedings.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6edbb0fde59ab0e5ff5e6f710922ba44
https://doi.org/10.1117/12.2086606
https://doi.org/10.1117/12.2086606
Autor:
Margarete Kops, Kiyotada Nakamura, Gota Niimi, B Santos, Ralf Kops, Yusuke Teramoto, Takuma Yokoyama, Takahiro Shirai, Noritaka Ashizawa, Guido Mertens, Hiroto Sato, Hironobu Yabuta, Kunihiko Kasama, Felix Küpper, Akihisa Nagano, Masaki Yoshioka
Publikováno v:
SPIE Proceedings.
Actinic mask inspection manufactures are currently searching for high-radiance EUV sources for their tools. LDP source, which was previously used for lithography purposes, was found to be a good candidate as it can provide sufficient power and radian
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f42282ce848c34cdcadfc66632c037d9
https://doi.org/10.1117/12.2046423
https://doi.org/10.1117/12.2046423