Zobrazeno 1 - 10
of 97
pro vyhledávání: '"Ralf Doerner"'
Autor:
Wolfgang Heinrich, Maruf Hossain, Siddhartha Sinha, Franz-Josef Schmuckle, Ralf Doerner, Viktor Krozer, Nils Weimann
Publikováno v:
IEEE Journal of Microwaves, Vol 1, Iss 1, Pp 364-373 (2021)
Connecting chips within a module is a basic requirement in transforming MMIC performance to system functionality. More and more applications demand for operation at high mm-wave frequencies or with ultra-large bandwidth. While semiconductor devices h
Externí odkaz:
https://doaj.org/article/df44a404a73f445cbfc53a01cc2c6c30
Publikováno v:
Frontiers in Virtual Reality, Vol 3 (2022)
Virtual Reality (VR) systems and VR content are complex, and their creation can mainly be conducted by experts in VR and related areas. That makes the use of VR challenging for experts from other domains, such as educators. In this paper, we build up
Externí odkaz:
https://doaj.org/article/1f8b6fa5854b40508d4de8f670f80839
Publikováno v:
2022 IEEE Microwaves, Antennas, and Propagation Conference (MAPCON).
Publikováno v:
On-Wafer Calibration Techniques Enabling Accurate Characterization of High-Performance Silicon Devices at the mm-Wave Range and Beyond ISBN: 9781003338994
This paper analyzes the commonly used wafer-level S-parameter calibration methods LRRM, multiline TRL and LRM+ for the sensitivity to the thermal variation of electrical characteristics of planar calibration standards. We demonstrate that the calibra
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::52c9ac9148d1126757f1ec6998b36d2e
https://doi.org/10.1201/9781003338994-29
https://doi.org/10.1201/9781003338994-29
Publikováno v:
On-Wafer Calibration Techniques Enabling Accurate Characterization of High-Performance Silicon Devices at the mm-Wave Range and Beyond ISBN: 9781003338994
This article examines the verification procedure of coplanar calibration standards based on the calibration comparison technique. For the first time, different commercially available alumina calibration substrates were compared using the NIST multili
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d2609a5f8e3723e3e6d4cb7935e40c4d
https://doi.org/10.1201/9781003338994-20
https://doi.org/10.1201/9781003338994-20
Publikováno v:
On-Wafer Calibration Techniques Enabling Accurate Characterization of High-Performance Silicon Devices at the mm-Wave Range and Beyond ISBN: 9781003338994
This paper investigates the impact of possible parameter extraction errors caused by inaccurate definition of the calibration reference impedance of in-situ multiline TRL. Two calibration sets implemented on GaAs and Si/SiGe:C wafer processes were qu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::79e3d0e11193783c6897149a99f2a1e8
https://doi.org/10.1201/9781003338994-30
https://doi.org/10.1201/9781003338994-30
Autor:
Ralf Doerner, A. Rumiantsev
Publikováno v:
On-Wafer Calibration Techniques Enabling Accurate Characterization of High-Performance Silicon Devices at the mm-Wave Range and Beyond ISBN: 9781003338994
In this article the accuracy of the LRM+ calibration is compared to that of the benchmark NIST multiline TRL procedure for the first time. The comparison is performed on NIST verified GaAs coplanar waveguide calibration reference material 8130. The N
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6ce8383bc0608bc00e173cd7cfaa7ffe
https://doi.org/10.1201/9781003338994-15
https://doi.org/10.1201/9781003338994-15
Publikováno v:
2021 51st European Microwave Conference (EuMC).
Autor:
Amit Shrestha, Ralf Doerner, Hady Yacoub, Tom K. Johansen, Wolfgang Heinrich, Viktor Krozer, Matthias Rudolph, Andreas Wentzel
Publikováno v:
2021 16th European Microwave Integrated Circuits Conference (EuMIC).
Autor:
Ralf Doerner
Publikováno v:
Virtual and Augmented Reality (VR/AR) ISBN: 9783030790615
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8645d8f13aad7aa2bf25efd03d5e172e
https://doi.org/10.1007/978-3-030-79062-2_11
https://doi.org/10.1007/978-3-030-79062-2_11