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pro vyhledávání: '"Rajeev Sanwal"'
Autor:
Seema Vinayak, Sumsullah Khan, Rajeev Sanwal, Dipendra Singh Rawal, Hitendra K. Malik, Sunil Kumar
Publikováno v:
Journal of Theoretical and Applied Physics. 13:299-304
In this study, a plasma-based low-temperature, low-pressure SiN film deposition is investigated for device applications. Ammonia, nitrogen and silane are being used for optimization of the quality of SiN film for device passivation by ICPCVD. Charact