Low temperature silicidation of Pd layers on crystalline silicon monitored via in situ resistance measurements

Autor: Faber, Erik J., Wolters, Rob A.M., Rajasekharan, Bijoy, Salm, Cora, Schmitz, Jurriaan, Edelstein, Daniel C., Schulz, Stefan E.

Publikováno v: Advanced Metallization Conference 2009: proceedings of the conference held September 13-15, 2009, Baltimore, Maryland, U.S.A, 133-140
STARTPAGE=133;ENDPAGE=140;TITLE=Advanced Metallization Conference 2009

Metal-silicon contacts may degrade during (SOI) wafer processing at unknown, high temperature conditions such as caused by sputtering or etching. We observed this phenomenon for Pd contacts on SOI wafers. Suicide formation of Pd contacts on crystalli

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=narcis______::af84585566ce8a23314af587cff35ce3
https://research.utwente.nl/en/publications/221949dc-9f39-46a3-82d0-3b352fc68541

Integrated ADI optical metrology solution for lithography process control of CD and OV

Autor: Cain, Jason P., Sanchez, Martha I., Strobl, Marlene, Tsai, Wilhelm, Lan, Andy, Chen, Tom, Hsu, Wilson, Chen, Henry, Liang, Frida, Wang, Alan, Hung, Platt, Huang, David, Chiu, Ethan, Yu, Paul, Song, Yi, Yuan, Sylvia, Dirks, Remco, Wright, Noelle, Ponomarenko, Mariya, Cramer, Hugo, Wisse, Baukje, Couraudon, Vincent, Rajasekharan, Bijoy, Plug, Reinder, Kruijswijk, Stefan, Niesing, Henk

Publikováno v: Proceedings of SPIE; April 2014, Vol. 9050 Issue: 1 p90501J-90501J-10, 8959610p

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