Zobrazeno 1 - 10
of 15
pro vyhledávání: '"Rai, Raghaw"'
Publikováno v:
In Progress in Crystal Growth and Characterization of Materials 2009 55(3):63-97
Publikováno v:
In Solid State Electronics December 2004 48(12):2299-2306
Autor:
Subramanian, Sam1 Sam.Subramanian@freescale.com, Rai, Raghaw, Kiem Ly, Chrastecky, Tony, Mulder, Randy, Harber, Kieth
Publikováno v:
Electronic Device Failure Analysis. May2008, Vol. 10 Issue 2, p20-28. 6p.
Theoretical and Experimental Investigation of Thermal Stability of HfO2 /Si and HfO2 /SiO2 Interfaces.
Publikováno v:
MRS Online Proceedings Library; 2002, Vol. 731 Issue 1, p1-4, 4p
Thermodynamic Stability of High-K Dielectric Metal Oxides ZrO2 and HfO2 in Contact with Si and SiO2.
Autor:
Gutowski, Maciej, Jaffe, John E., Liu, Chun-Li, Stoker, Matt, Hegde, Rama I., Rai, Raghaw S., Tobin, Philip J.
Publikováno v:
MRS Online Proceedings Library; 2002, Vol. 716 Issue 1, p1-5, 5p
Publikováno v:
Journal of the American Ceramic Society; 1990, Vol. 73 Issue 3, p615-620, 6p
Publikováno v:
Journal of the American Ceramic Society; 1988, Vol. 71 Issue 4, p236-244, 9p
Autor:
Kukli, Kaupo, Ritala, Mikko, Leskelä, Markku, Sajavaara, Timo, Keinonen, Juhani, Gilmer, David, Hegde, Rama, Rai, Raghaw, Prabhu, Lata
Publikováno v:
Journal of Materials Science: Materials in Electronics; May 2003, Vol. 14 Issue: 5-7 p361-367, 7p
Autor:
Gutowski, Maciej, Jaffe, John E., Liu, Chun-Li, Stoker, Matt, Hegde, Rama I., Rai, Raghaw S., Tobin, Philip J.
Publikováno v:
Applied Physics Letters; 3/18/2002, Vol. 80 Issue 11, p1897, 3p, 1 Diagram, 1 Chart, 1 Graph
Publikováno v:
Microscopy & Microanalysis; Aug2014 Supplement, Vol. 20 Issue S3, p1000-1001, 2p