Zobrazeno 1 - 10
of 24
pro vyhledávání: '"Ragava Lokasani"'
Autor:
Takeshi Higashiguchi, Shinichi Namba, Tadashi Hatano, Hiromu Kawasaki, Ragava Lokasani, Michal Zeman, Gerry O'Sullivan, Weihua Jiang, Y. Shimada, Jan Nikl, Jiri Limpouch, Misaki Shoji, Takeo Ejima, Kyoya Anraku
Publikováno v:
Optics express. 27(23)
Our measurement of the soft X-ray emission of Mo plasmas produced by picosecond Nd:YAG lasers emitting on the fundamental (1064 nm, 150 ps) and second (532 nm, 130 ps) harmonics is presented. The contrast in intensity between spectral peaks and the i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c143a45efe4523f743464ce4097dcf14
https://pubmed.ncbi.nlm.nih.gov/31878405
https://pubmed.ncbi.nlm.nih.gov/31878405
Autor:
John Sheil, Jiri Limpouch, Oisin Maguire, L. Maresova, Emma Sokell, J. Proska, G. Joseph, Padraig Dunne, T. McCormack, Gerry O'Sullivan, Ragava Lokasani, Ellie Floyd Barte, Fergal O'Reilly, Domagoj Kos
Publikováno v:
Laser and Particle Beams. 35:574-578
The effects of shape and thickness of a tin surface layer and of the energy of a 170 ps neodymium:yttrium-aluminum-garnet laser pulse on the conversion efficiency (CE) into extreme ultraviolet emission in the 13.5 nm region is investigated. Whereas a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::51d77782d515c2aa49a395837317eef9
https://doi.org/10.1017/s0263034617000623
https://doi.org/10.1017/s0263034617000623
XUV generation from the interaction of pico- and nanosecond laser pulses with nanostructured targets
Autor:
Paul Sheridan, J. Proska, Ragava Lokasani, Domagoj Kos, Jiri Limpouch, Gerry O'Sullivan, Ellie Floyd Barte, Fergal O'Reilly, Oisin Maguire, L. Stolcova, Padraig Dunne, Emma Sokell, T. McCormack
Publikováno v:
X-ray Lasers and Coherent X-ray Sources: Development and Applications.
Laser-produced plasmas are intense sources of XUV radiation that can be suitable for different applications such as extreme ultraviolet lithography, beyond extreme ultraviolet lithography and water window imaging. In particular, much work has focused
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e04a2879fc0512bd6061b90b67a5969f
https://doi.org/10.1117/12.2265984
https://doi.org/10.1117/12.2265984
Autor:
J. Shiel, Emma Sokell, Bowen Li, Takeshi Higashiguchi, Chihiro Suzuki, Fergal O'Reilly, T. Wu, Elaine Long, G O'Sullivan, Ragava Lokasani, Padraig Dunne, Lingyun Liu, D. Kilbane, T. McCormack
Publikováno v:
AIP Conference Proceedings.
Sources based on laser produced plasmas of tin (Sn) are currently being developed for extreme ultraviolet lithography for semiconductor fabrication. Since they operate at short wavelength (13.5 nm) they are capable of producing features with critical
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::042ddff28d22ae1cdb422cc6e5e40fdc
https://doi.org/10.1063/1.4975742
https://doi.org/10.1063/1.4975742
Autor:
John Sheil, Takeshi Higashiguchi, Ellie Floyd Barte, Chihiro Suzuki, Jiri Limpouch, Gerry O'Sullivan, Padraig Dunne, Toshiki Tamura, Hiroyuki Hara, Ragava Lokasani, Takuya Gisuji
Publikováno v:
Journal of Physics B: Atomic, Molecular and Optical Physics. 51:215001
XUV spectra of 150 ps laser-produced samarium (Sm) plasmas in the 1.8–10 nm wavelength region, where Δn = 1, n = 4 − n = 5 and Δn = 0, n = 4 − n = 4 transitions dominate the observed emission, were investigated experimentally and theoreticall
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b1689f353662eb614c6650f0da5be9e8
https://doi.org/10.1088/1361-6455/aae12d
https://doi.org/10.1088/1361-6455/aae12d
Autor:
Bowen Li, Takeshi Higashiguchi, Hiroyuki Hara, When Bo Chen, Gerry O'Sullivan, Weihua Jiang, Takuya Gisuji, Chihiro Suzuki, Ragava Lokasani, Ellie Floyd Barte, Tadashi Hatano, Takeo Ejima, Toshiki Tamura, J. Limpouch, Padraig Dunne, Akira Sasaki
Publikováno v:
Journal of Applied Physics. 123:183301
We have characterized the soft x-ray and extreme ultraviolet (XUV) emission of rhodium (Rh) plasmas produced using dual pulse irradiation by 150-ps or 6-ns pre-pulses, followed by a 150-ps main pulse. We have studied the emission enhancement dependen
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::889055f71fa62faae4328d10c649461f
https://doi.org/10.1063/1.5024344
https://doi.org/10.1063/1.5024344
Autor:
Patrick Hayden, Ragava Lokasani, Gerry O'Sullivan, Paul Sheridan, Akira Endo, Jiri Limpouch, Elaine Long, Fergal O'Reilly, Padraig Dunne
Publikováno v:
SPIE Proceedings.
This paper describes the extreme ultraviolet and soft x-ray emission recorded in the 2-12 nm region from Mo, Ru, Rh and Pd ions present in the laser produced plasmas. The spectra were found to be dominated by 3p-3d transitions in the 5-8 nm region, w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8702fc774f1d7a97249a6f3d0ea11f52
https://doi.org/10.1117/12.2176551
https://doi.org/10.1117/12.2176551
Autor:
Petr Gavrilov, Takeshi Higashiguchi, Jiri Limpouch, Domagoj Kos, Alexandr Jancarek, Gerry O'Sullivan, Michal Nevrkla, Ragava Lokasani, Petr Hribek, Ellie Floyd Barte, Ladislav Pina
Publikováno v:
Journal of Physics B: Atomic, Molecular and Optical Physics. 50:145001
The soft x-ray emission spectra of femtosecond-laser-produced plasmas from 2nd row transition elements from yttrium (Z = 39) to palladium (Z = 46), with the exception of technetium (Z = 43), were measured in the 1–5 nm region. Plasmas were produced
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7827886a1d81fbc6c60f54e1fdb84e5b
https://doi.org/10.1088/1361-6455/aa7791
https://doi.org/10.1088/1361-6455/aa7791
Autor:
Ragava Lokasani, Ivan Pollentier, Roel Gronheid, Thomas B. Lucatorto, Shannon B. Hill, Charles S. Tarrio
Publikováno v:
Extreme Ultraviolet (EUV) Lithography IV.
EUV photoresists are considered as a potential source of optics contamination, since they introduce irradiation induced outgassing in the EUV vacuum environment. Therefore, before these resists can be used on e.g. ASML NXE:3100 or NXE:3300, they need
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5bd04619fa02f19fd330a1f47f01b1fb
https://doi.org/10.1117/12.2011541
https://doi.org/10.1117/12.2011541
Autor:
Takeo Ejima, Gerry O'Sullivan, Goki Arai, Bowen Li, Takeshi Higashiguchi, Weihua Jiang, Hiroyuki Hara, Padraig Dunne, Ragava Lokasani, Yoshiki Kondo, Tadashi Hatano, Thanh Hung Dinh, Jiri Limpouch, Tetsuya Makimura
Publikováno v:
Applied Physics Letters. 109:194103
We demonstrate efficient enhancement of soft X-ray (SXR) emission from molybdenum plasmas produced using dual pulse irradiation, in which 10-ns and 150-ps pre-pulses were followed by a 150-ps main pulse. The number of photons was observed to be 5.3
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::524e2fefacc90c4ee56cc50f80e1655e
https://doi.org/10.1063/1.4967310
https://doi.org/10.1063/1.4967310