Zobrazeno 1 - 10
of 14
pro vyhledávání: '"Rafik Smaali"'
Autor:
Mohammad, Khaywah, Audrey, Potdevin, François, Rvert, Rachid, Mahiou, Youcef, Ouerdane, Anthony, Désert, Stéphane, Parola, Geneviève, Chadeyron, Emmanuel, Centeno, Rafik, Smaali, Antoine, Moreau
Publikováno v:
J. Phys. Chem. C 2021, 125, 14, 7780-7790
Improving phosphor photoluminescence efficiency is a key parameter to boost the performances of many optical devices. In this work, colloidal silver nanocubes, homogeneously spread on a luminescent surface, have proved to help both injecting and extr
Externí odkaz:
http://arxiv.org/abs/2211.14685
Autor:
Patrícia Loren, Pierre Fehlen, Julien Guise, Franziska Barho, Melissa Najem, Fernando Gonzalez-Posada, Stéphane Blin, Laurent Cerutti, Rafik Smaali, Emmanuel Centeno, Thierry Taliercio
Publikováno v:
SPIE Proceedings
SPIE Proceedings, 12002, SPIE, pp.1, 2022, ⟨10.1117/12.2612190⟩
SPIE Proceedings, 12002, SPIE, pp.1, 2022, ⟨10.1117/12.2612190⟩
In this paper, III-IV semiconductors are demonstrated as strong candidates for plasmonics applications in the Mid-IR. The perfect absorbers (PA) fabricated with heavily doped semiconductors features strong coupling between Fabry-Perot and localized s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::fd538e110940628bd0bc9ef258ad2660
https://hal.science/hal-03914858/file/Taliercio_Oxide_Symposium_22_01_05.pdf
https://hal.science/hal-03914858/file/Taliercio_Oxide_Symposium_22_01_05.pdf
Autor:
Rachid Mahiou, Audrey Potdevin, Emmanuel Centeno, Mohammad Y. Khaywah, Geneviève Chadeyron, Antoine Moreau, Rafik Smaali, François Réveret, Youcef Ouerdane, Stephane Parola, Anthony Désert
Publikováno v:
Journal of Physical Chemistry C
Journal of Physical Chemistry C, 2021, 125 (14), pp.7780-7790. ⟨10.1021/acs.jpcc.1c01140⟩
Journal of Physical Chemistry C, American Chemical Society, 2021, 125 (14), pp.7780-7790. ⟨10.1021/acs.jpcc.1c01140⟩
Journal of Physical Chemistry C, 2021, 125 (14), pp.7780-7790. ⟨10.1021/acs.jpcc.1c01140⟩
Journal of Physical Chemistry C, American Chemical Society, 2021, 125 (14), pp.7780-7790. ⟨10.1021/acs.jpcc.1c01140⟩
International audience; Improving phosphor photoluminescence efficiency is a key parameter to boost the performances of many optical devices. In this work, colloidal silver nanocubes, homogeneously spread on a luminescent surface, have proved to help
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::75d274b1e5b118f095f969d826ff3a2c
Publikováno v:
Optics Letters
Optics Letters, Optical Society of America-OSA Publishing, 2016, 41 (16), ⟨10.1364/OL.41.003900⟩
Optics Letters, Optical Society of America-OSA Publishing, 2016, 41 (16), ⟨10.1364/OL.41.003900⟩
We theoretically demonstrate resonant modulation of terahertz (THz) waves with photo-designed metasurfaces. Our approach bypasses the short penetration length issue of the optical pump that prevents photo-generated thick metamaterials. We propose a t
Publikováno v:
Scientific Reports
Scientific Reports, Nature Publishing Group, 2016, 6, pp.32589. ⟨10.1038/srep32589⟩
Scientific Reports, 2016, 6, pp.32589. ⟨10.1038/srep32589⟩
Scientific Reports, Nature Publishing Group, 2016, 6, pp.32589. ⟨10.1038/srep32589⟩
Scientific Reports, 2016, 6, pp.32589. ⟨10.1038/srep32589⟩
We propose a design for an universal absorber, characterized by a resonance frequency that can be tuned from visible to microwave frequencies independently of the choice of the metal and the dielectrics involved. An almost perfect absorption up to 99
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::82179d0642697c046eb7ae349a637d29
https://hal.archives-ouvertes.fr/hal-01626666/document
https://hal.archives-ouvertes.fr/hal-01626666/document
Publikováno v:
Journal of Applied Physics
Journal of Applied Physics, American Institute of Physics, 2012, 111, pp.083102. ⟨10.1063/1.3703670⟩
Journal of Applied Physics, 2012, 111, pp.083102. ⟨10.1063/1.3703670⟩
Journal of Applied Physics, American Institute of Physics, 2012, 111, pp.083102. ⟨10.1063/1.3703670⟩
Journal of Applied Physics, 2012, 111, pp.083102. ⟨10.1063/1.3703670⟩
International audience; A methodology is proposed for finding structures that are, optically speaking, locally optimal : a physical analysis of much simpler structures is used to constrain the optimization process. The obtained designs are based on a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ec3dd989d9fae9453ce376547ee9aa3e
Autor:
Viala, Bernard, Rafik, Smaali, Queffelec, Patrick, Bènevent, Evangéline, Michel, Jean-Philippe
Publikováno v:
France, N° de brevet: EP 2323142 A1. 2010
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::034820646e4126d8e2770df05fa374e9
https://hal.archives-ouvertes.fr/hal-01698445
https://hal.archives-ouvertes.fr/hal-01698445
Autor:
Faliniaina Rasoanoavy, Vincent Laur, Serge de Blasi, Jorge Lezaca, Rafik Smaali, Patrick Queffelec, Kevin Garello, Bernard Viala
Publikováno v:
11th Joint Magnetism and Magnetic Material-INTERMAG Conference Proc.
11th Joint Magnetism and Magnetic Material-INTERMAG Conference
11th Joint Magnetism and Magnetic Material-INTERMAG Conference, Jan 2010, Detroit, United States
HAL
11th Joint Magnetism and Magnetic Material-INTERMAG Conference
11th Joint Magnetism and Magnetic Material-INTERMAG Conference, Jan 2010, Detroit, United States
HAL
International audience; The variation of the permeability of a multilayered PVDF/CoFeHfN (piezoelectric/magnetostrictive) composite material under the action of a DC voltage is demonstrated. The driven-voltage permeability is first predicted using a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::42b523a4aac3076397c428cb81352511
https://hal.univ-brest.fr/hal-00487230
https://hal.univ-brest.fr/hal-00487230
Three-dimensional rigorous simulation of EUV defective masks using modal method by Fourier expansion
Publikováno v:
Proc. SPIE Vol. 6151 Emerging Lithographic Technologies X
In Extreme Ultraviolet Lithography, the electromagnetic modelling of the mask allows determining the influence of the mask structure on the electromagnetic field. That makes it possible to take into account the presence of a defect modifying the mult
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::092ec3e332d063d7736e85699a9e531f
https://hal.archives-ouvertes.fr/hal-00023211
https://hal.archives-ouvertes.fr/hal-00023211
Publikováno v:
SPIE'05
SPIE'05, 2005, vol. 5751, pp 629-639
SPIE Proceedings vol. 5751, Emerging Lithographic Technologies IX
SPIE'05, 2005, vol. 5751, pp 629-639
SPIE Proceedings vol. 5751, Emerging Lithographic Technologies IX
In Extreme Ultraviolet Lithography, the electromagnetic modeling of the mask allows to determine the influence of the mask structure on the electromagnetic field. That makes it possible to take into account the presence of a defect modifying the mult
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::494b995cd0962e1095fff52aae594410
https://hal.archives-ouvertes.fr/hal-00387451
https://hal.archives-ouvertes.fr/hal-00387451