Zobrazeno 1 - 10
of 21
pro vyhledávání: '"Radim Hrdy"'
Publikováno v:
Metals, Vol 10, Iss 7, p 949 (2020)
Wire electrical discharge machining is an unconventional machining technology that is crucial in many industries. The surface quality of the machined parts is carefully monitored, but the condition of the subsurface layer also plays a crucial role, e
Externí odkaz:
https://doaj.org/article/5ba266f3090a48a0b581cfe32cd3c465
Publikováno v:
Sensors, Vol 9, Iss 4, Pp 2352-2362 (2009)
The fabrications of iron oxides nanoparticles using co-precipitation and gadolinium nanoparticles using water in oil microemulsion method are reported in this paper. Results of detailed phase analysis by XRD and Mössbauer spectroscopy are discussed.
Externí odkaz:
https://doaj.org/article/c1b1e31bdb3c4819a4dc856eb2be4ebd
Publikováno v:
Metals. 2020, vol. 10, issue 7, p. 1-21.
Metals, Vol 10, Iss 949, p 949 (2020)
Metals
Volume 10
Issue 7
Metals, Vol 10, Iss 949, p 949 (2020)
Metals
Volume 10
Issue 7
Wire electrical discharge machining is an unconventional machining technology that is crucial in many industries. The surface quality of the machined parts is carefully monitored, but the condition of the subsurface layer also plays a crucial role, e
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6686d48d12f9984e3c65022a12e44fbf
https://hdl.handle.net/11012/193425
https://hdl.handle.net/11012/193425
Autor:
Radim Zahradnicek, Libor Benes, Tomas Prokes, Pavel Hrabec, Radim Hrdy, Josef Bednar, Katerina Mouralova
Publikováno v:
Materials and Manufacturing Processes. 34:70-82
Wire electrical discharge machining (WEDM) is a non-traditional technology utilized to manufacture parts of complex shapes or machining the materials conventionally difficult to process. It is also...
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::eb5b109f98e03768fcf6645abd24973a
https://doi.org/10.1080/10426914.2018.1544714
https://doi.org/10.1080/10426914.2018.1544714
Autor:
Katerina Mouralova, Radomil Matousek, Lenka Klakurková, Vaclav Kana, Tomas Prokes, Radim Hrdy
Publikováno v:
Archives of Civil and Mechanical Engineering. 18:1318-1331
Wire electrical discharge machining (WEDM) is a key technological process for the production of parts from semi-finished products to the final heat treatment as it also enables the machining of very hard material. The quality of an electro-erosive ma
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5064d3d0731931bc9920a1d2299d1fe1
https://doi.org/10.1016/j.acme.2018.04.004
https://doi.org/10.1016/j.acme.2018.04.004
Publikováno v:
MM Science Journal. 2017:2109-2113
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::68095faeeb2fbe45eda6ae54b34f04b8
https://doi.org/10.17973/mmsj.2017_12_201797
https://doi.org/10.17973/mmsj.2017_12_201797
Publikováno v:
MM Science Journal. 2016:1630-1633
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7c06181c19da73e916b16f7d26e00b66
https://doi.org/10.17973/mmsj.2016_12_2016200
https://doi.org/10.17973/mmsj.2016_12_2016200
Autor:
Silvestr Vancik, Ulrich Schmid, Jaromir Hubalek, Radim Hrdy, Michael Schneider, Jan Prasek, Patrik Fillner
Publikováno v:
2019 42nd International Spring Seminar on Electronics Technology (ISSE).
We presented the development and characterization of high-k stack HfO 2 /Al 2 O 3 capacitor, fabricated directly on chip. The capacitor is based on nanolaminate material directly grown by plasma-assisted Atomic Layer Deposition (ALD)in a single react
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bc1fda800dcbc2357bedc03e25f663d1
https://doi.org/10.1109/isse.2019.8810156
https://doi.org/10.1109/isse.2019.8810156
Publikováno v:
2019 42nd International Spring Seminar on Electronics Technology (ISSE).
In this paper we optimize cryogenic deep reactive ion etching processes to achieve the best aspect ratios of holes in a silicon substrate that is supposed to be used for fabrication of on-chip energy storage. By optimizing capacitively coupled plasma
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::57e1860bc3a27d73283ce85559ad5c32
https://doi.org/10.1109/isse.2019.8810293
https://doi.org/10.1109/isse.2019.8810293
Publikováno v:
2018 41st International Spring Seminar on Electronics Technology (ISSE).
Atomic layer deposition (ALD) is a strong method of fabrication of high-k dielectrics with excellent properties. We present the ALD grown high-k CMOS compatible dielectrics used for capacitors on a chip application. Several dielectric films based on
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2cfd554b7f4c437b420b7965faa564f6
https://doi.org/10.1109/isse.2018.8443766
https://doi.org/10.1109/isse.2018.8443766