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pro vyhledávání: '"Radhika Kanakam"'
Autor:
Atchaih Naidu Varadharajula, Laxminarayana Gangalakurti, K. Venugopal Reddy, Chhabra Inder Mohan, Radhika Kanakam
Publikováno v:
Intelligent Manufacturing and Energy Sustainability ISBN: 9789813344426
A single RF ion source with plasma bridge neutralizer being used for sputtering of water cooled target materials with partial pressure of oxygen into the chamber. In the present work, single-layer Ta2O5 and SiO2 films are grown on super polished cera
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5043b3ee374c2d150344537b7d65d83a
https://doi.org/10.1007/978-981-33-4443-3_22
https://doi.org/10.1007/978-981-33-4443-3_22
