Zobrazeno 1 - 10
of 3 061
pro vyhledávání: '"RF sputtering"'
Autor:
Puyou Ying, Hanying Sun, Ping Zhang, Changhong Lin, Tao Yang, Jianbo Wu, Min Huang, Tianle Wang, Zhibiao Lian, Vladimir Levchenko
Publikováno v:
Journal of Materials Research and Technology, Vol 32, Iss , Pp 530-540 (2024)
In this study, a dense WS2 coating was deposited via high-power impulse magnetron sputtering (HiPIMS) after solving the glow discharge problem, and it was compared with WS2 coating deposited via radio frequency (RF) sputtering. The latter showed a co
Externí odkaz:
https://doaj.org/article/b233df5ee16c4299ba96dc26c97e13ba
Autor:
Roberto Jakomin, Stefano Rampino, Giulia Spaggiari, Michele Casappa, Giovanna Trevisi, Elena Del Canale, Enos Gombia, Matteo Bronzoni, Kodjo Kekeli Sossoe, Francesco Mezzadri, Francesco Pattini
Publikováno v:
Solar, Vol 4, Iss 1, Pp 83-98 (2024)
In recent years, research attention has increasingly focused on thin-film photovoltaics utilizing Sb2Se3 as an ideal absorber layer. This compound is favored due to its abundance, non-toxic nature, long-term stability, and the potential to employ var
Externí odkaz:
https://doaj.org/article/91bf427b801a4ee7a2711b254eca89fb
Autor:
Claudia Diletto, Fiorita Nunziata, Salvatore Aprano, Ludovico Migliaccio, Maria Grazia Maglione, Alfredo Rubino, Paolo Tassini
Publikováno v:
Crystals, Vol 14, Iss 9, p 776 (2024)
Indium tin oxide (ITO) is a transparent conductive oxide (TCO) commonly used in the realization of optoelectronic devices needing at least a transparent electrode. In this work, ITO thin films were deposited on glass substrates by non-reactive RF mag
Externí odkaz:
https://doaj.org/article/8760fec879224eefad2225f1d80ab7ca
Autor:
Ambati Mounika Sai Krishna, Kumar Babu Busi, Brindha Ramasubramanian, Vundrala Sumedha Reddy, Aniket Samanta, Seeram Ramakrishna, Siddhartha Ghosh, Sabyasachi Chakrabortty, Goutam Kumar Dalapati
Publikováno v:
Memories - Materials, Devices, Circuits and Systems, Vol 7, Iss , Pp 100100- (2024)
High-quality copper oxide (CuO) thin films were deposited on the silicon (Si) substrate at the room temperature using the physical vapour deposition (PVD) technique named radio frequency (RF) sputtering. The copper-oxide thin-films were single crysta
Externí odkaz:
https://doaj.org/article/84dd0fcec9fc4ec68dbf38943ba95926
Autor:
Chandan Yadav, Sushil Kumar
Publikováno v:
Results in Surfaces and Interfaces, Vol 14, Iss , Pp 100210- (2024)
A brief review on history, progress and development of perovskite solar cells fabricated via conventional solution based deposition methods and vacuum based deposition method is discussed in the present article. Working principle and functioning of l
Externí odkaz:
https://doaj.org/article/41e806d63dae4ee7a289a209ae35d6bf
Publikováno v:
Applied Surface Science Advances, Vol 19, Iss , Pp 100549- (2024)
Oblique ion beam patterned and structured thin films hold promise as an advanced material for applications to photonics, micro- to nano-electronics, electro-optical and electrochemical devices fabrication. Herein, for the first time, we report the fa
Externí odkaz:
https://doaj.org/article/29b4f28c93de4c5192e312448e4c65a9
Publikováno v:
Materials, Vol 17, Iss 13, p 3142 (2024)
Thin films of transition metal oxides and oxynitrides have proven highly effective in protecting stainless steels against corrosion in both chemically aggressive environments and biological fluids. In the present work, cerium zirconium oxynitride thi
Externí odkaz:
https://doaj.org/article/aa994322aa574cb18256147998656ea0
Autor:
Hyung-Jin Lee, Soo-Young Moon, Hee-Jae Lee, Dong-Wook Byun, Seung-Woo Jung, Michael A. Schweitz, Minkyung Kim, Jong-Min Oh, Weon Ho Shin, Chulhwan Park, Sang-Mo Koo
Publikováno v:
Journal of Materials Research and Technology, Vol 24, Iss , Pp 1579-1588 (2023)
In this study, we investigated the influence of post-deposition annealing (PDA) process on lithium phosphate (Li3PO4) solid-state thin films on silicon carbide (SiC) substrate in terms of materials and electrical properties. Li3PO4 thin films were d
Externí odkaz:
https://doaj.org/article/080690a9589249dc9a5388842fd122ec
Autor:
Nadjet AKLOUCHE, MOSBAH AMMAR
Publikováno v:
Iranian Journal of Materials Science and Engineering, Vol 20, Iss 1, Pp 1-13 (2023)
This work aims to prepare and study amorphous carbon nitride (CNx) films. Films were deposited by reactive magnetron radiofrequency (RF) sputtering from graphite target in argon and nitrogen mixture discharge at room temperature. The ratio of the gas
Externí odkaz:
https://doaj.org/article/bb9550d3f4de452b93b072025746d621
Publikováno v:
Materials, Vol 17, Iss 7, p 1609 (2024)
CuGaO2 thin films were deposited using the RF magnetron sputtering technique using Cu2O and Ga2O3 targets. The films were deposited at room temperature onto a quartz slide. The sputtering power of Cu2O remained constant at 50 W, while the sputtering
Externí odkaz:
https://doaj.org/article/9f53f2170b194850894a80c61bd6780e