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Effects of dc substrate bias on the properties of rf‐sputtered amorphous germanium ditelluride films
Publikováno v:
Journal of Applied Physics. 45:50-59
We have studied the changes in chemical composition, capture and release of argon, electrical conductivity, and morphology of crystallization which result from changes in dc bias applied to the substrate during the rf sputtering of amorphous thin fil
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ed30db6346db06d7659a0bd6041e1dda
https://doi.org/10.1063/1.1663015
https://doi.org/10.1063/1.1663015
