Zobrazeno 1 - 1
of 1
pro vyhledávání: '"R. W. Chabot"'
Autor:
R. W. Chabot, S. Aisenberg
Publikováno v:
Journal of Vacuum Science and Technology. 10:104-107
A review of some dominant mechanisms in ion plating is made. Factors influencing throwing power and film quality are discussed and the damaging effects of a high ambient gas background are considered with a view toward minimizing the harmful effects
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e96823a8c201a374b4d05f9aea4b9f80
https://doi.org/10.1116/1.1317915
https://doi.org/10.1116/1.1317915
