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pro vyhledávání: '"R. W. Arling"'
Autor:
D. A. Tichenor, A. K. Ray-Chaudhuri, G. D. Kubiak, S. J. Haney, K. W. Berger, R. P. Nissen, G. A. Wilkerson, R. H. Stulen, P. H. Paul, R. W. Arling, T. E. Jewell, Edita Tejnil, W. C. Sweatt, W. W. Chow, J. E. Bjorkholm, R. R. Freeman, M. D. Himel, A. A. MacDowell, D. M. Tennant, L. A. Fetter, O. R. Wood, W. K. Waskiewicz, D. L. White, D. L. Windt
Publikováno v:
Extreme Ultraviolet Lithography.
High-resolution imaging of a reflection mask over a 0.4 mm diameter field of view has been demonstrated using a new extreme ultraviolet (EUV) imaging system. A significant reduction in debris from the laser plasma source (LPS) has extended the life o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3f3187c38e9b4d0bebe946a4fd2ae379
https://doi.org/10.1364/eul.1994.eos.89
https://doi.org/10.1364/eul.1994.eos.89
