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pro vyhledávání: '"R. Tadjine"'
Publikováno v:
ICREEC 2019 ISBN: 9789811554438
In this work, nitriding by Plasma Immersion Ion Implantation (PIII) treatment of low carbon steel was performed in a plasma reactor with an inductive RF source (l3.56 MHz) at low pressure in order to investigate the influence of the process condition
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::98c74acf327be2b81acb05fe7d099b40
https://doi.org/10.1007/978-981-15-5444-5_65
https://doi.org/10.1007/978-981-15-5444-5_65
Oxygen flow rate effect on copper oxide thin films deposited by radio frequency magnetron sputtering
Publikováno v:
Thin Solid Films. 741:139013
Copper oxide thin films are prepared by radio frequency magnetron sputtering technology. The analysis of the deposited films by X-Ray Diffraction (XRD), spectrometry and electrical resistivity measurements is carried out. The results show that the wo
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Publikováno v:
Protection of Metals and Physical Chemistry of Surfaces. 53:527-533
Anticorrosion TiO2 films were deposited by reactive r.f. magnetron sputtering method, on stainless steel substrates. The effect of bias voltage on the electrochemical corrosion behaviors was investigated. The microstructure of titanium dioxide thin f
Publikováno v:
Surface and Coatings Technology. 309:573-578
Magnetron sputtering erodes the target non-uniformly, leading to the formation of a circular deep trench called groove, which will have a direct effect on plasma and thin film deposition properties. These effects are highlighted by measurements of th
Publikováno v:
Thin Solid Films. 616:521-529
The aim of this paper is to investigate the effects of the substrate bias on the structure and properties of the TiCN thin films. The TiCN films were grown onto silicon and steel substrates by rf reactive magnetron sputtering from a pure titanium tar
Publikováno v:
Plasma Science and Technology. 22:065402
Publikováno v:
Physics of Plasmas. 26:113505
Electron filtering via an external magnetic field barrier is an important issue for volume negative ion production. In this work, we study the plasma properties in an inductively coupled plasma source in the presence of a magnetic filter. Our investi
Publikováno v:
Advanced Materials Research. 227:181-184
A non invasive ex-situ harmonic probe technique was used to characterize the plasma-generated harmonics of Ar/O2 plasma. To extract the harmonics, we used an iterative least-squares curve fitting algorithm and taking into account the presence of para
Publikováno v:
International Journal of Plasma Science and Engineering. 2008:1-5
The aim of our study is to generate microstructures in order to improve optical properties of monocrystalline silicon. By mean of fluorocarbon plasma barrel texturing and under certain process conditions, silicon turned black. As a result of silicon