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Étude de la coupure des liaisons o-si d'éthers siliciés du type en présence d'agent nucléophile et/ou d'acide

Autor: Claude Montginoul, François Schué, Louis Giral, N. Madit, R. Sagnes

Publikováno v: Bulletin des Sociétés Chimiques Belges. 99:147-166

We report a study on the hydrolytic instability of the oxygen-silicon bond of the following compounds: p-tert-butyldimethylsilyloxytoluene, p-trimethylsilyloxytoluene and poly(p-trimethylsilyloxystyrene). The instability occurs in an acidic media: HC

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::4399bb0ac3bbaf6dad5c93838123c436
https://doi.org/10.1002/bscb.19900990303

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Etude Des Reactions De Coupure Des Liaisons O-Si(CH3)3 Dans Des Polystyrenes Silicies En Presence De Sels De Triphenylsulfonium Avec Ou Sans Perylene Sous Irradiation UV Et Visible Et En Couche Mince

Autor: C. Rosilio, François Schué, N. Madit, Louis Giral, Claude Montginoul, J. C. Guibert, R. Sagnes

Publikováno v: Bulletin des Sociétés Chimiques Belges. 101:15-28

This paper describes a positive resist formulation containing silylated polystyrene polymer, made photosensitive at wavelengths from 220 to 310 nm by means of an onium salt sensitizer ((C6H5)3SMXn) and at wavelengths from 360 to 450 nm by means of an

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::f6a4abf9f95d406965e1c3f88fd00799
https://doi.org/10.1002/bscb.19921010104

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ChemInform Abstract: Cleavage of the O-Si Bond of Silyl Ethers of Type Ar-O-SiR1R2R3 (Ar: Aryl) in the Presence of Nucleophilic Agents and/or Acids

Autor: Louis Giral, F. Schue, R. Sagnes, Claude Montginoul, N. Madit

Publikováno v: ChemInform. 21

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::9a2b8dfe2edaccabe02a35ea0af082d7
https://doi.org/10.1002/chin.199036069

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Akademický článek

Terahertz Generation in InAs Epitaxial Films.

Autor: Trukhin, V. N.¹ (AUTHOR) valera.truchin@mail.ioffe.ru, Solov'ev, V. A.¹ (AUTHOR), Mustafin, I. A.¹ (AUTHOR), Chernov, M. Yu.¹ (AUTHOR)

Publikováno v: Technical Physics Letters. 2023 Suppl 2, Vol. 49, pS146-S149. 4p.

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Akademický článek

Acousto-optical coupling in two-dimensional air-slot phoxonic crystal heterostructure cavity.

Autor: MA ZHEN-MENG¹, TIAN MIAO¹ tian_miao@163.com, ZHANG LEI¹, GAO PEI-FENG²

Publikováno v: Optica Applicata. 2023, Vol. 53 Issue 4, p603-619. 17p.

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Etude de résines négatives sensibles aux électrons utilisées dans les procédés de microlithographie

Autor: C. Rosilio, C. Montginoul, R. Sagnes, L. Giral, B. Holil, F. Buiguez, F. Schué, B. Serre

Publikováno v: Revue de Physique Appliquée
Revue de Physique Appliquée, Société française de physique / EDP, 1985, 20 (3), pp.143-149. ⟨10.1051/rphysap:01985002003014300⟩

Les poly(parachlorométhylstyrène) et poly(parabromostyrène) présentent des propriétés lithographiques intéressantes sous irradiation électronique. Une sensibilité élevée, associée à de bonnes propriétés de résistance à la gravure pla

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::021111440b76f93358c55e9b217abfd3
https://doi.org/10.1051/rphysap:01985002003014300

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Poly-4-bromostyrene, a high performance negative electron resist

Autor: F. Schué, B. Holil, R. Sagnes, C. Montginoul, L. Giral, F. Buiguez, B. Serre, Ch. Rosilio

Publikováno v: Microelectronic Engineering. 5:315-319

Poly-4-bromostyrene (PBS) is shown to have desirable combination of properties, including high sensitivity and high resolution. As a consequence, it is a very attractive candidate for high performance electron beam lithography. The dependence of resi

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::5a12ff2551e2328eecf8cc54be2f150f
https://doi.org/10.1016/0167-9317(86)90059-6

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Synthesis and studies of resists bearing tetrathiafulvalene groups and sensitive to U.V. and electron beam irradiations

Autor: F. Schue, C. Monginoul, J.M. Fabre, L. Giral, A. Mungroo, R. Sagnes

Publikováno v: Microelectronic Engineering. 6:433-438

Polymers bearing tetrathiafulvalene groups have been tested under e-beam and UV irradiation. The dependence of resist sensitivity on molecular weight is reported. Resolution between 0,1 and 0, 4 μm were obtained. These polymers are shown to have des

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::0ae7f9bb01adb716b3663dc69497164c
https://doi.org/10.1016/0167-9317(87)90070-0

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