Zobrazeno 1 - 10
of 82
pro vyhledávání: '"R. Rokitski"'
Autor:
R. Rokitski, Pang-Chen Sun, Dan M. Marom, Nikola Alic, Dmitriy Panasenko, Yeshaiahu Fainman, Yuri T. Mazurenko
Publikováno v:
The Art and Science of Holography: A Tribute to Emmett Leith and Yuri Denisyuk
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::686689d8b5678039e4bc75842e87a7c8
https://doi.org/10.1117/3.2265060.ch10
https://doi.org/10.1117/3.2265060.ch10
Autor:
Jen-Shiang Wang, Josh Thornes, R. Burdt, Mason Eric Anders, Gregory Rechtsteiner, R. Rokitski, T. Bibby, M. Haviland, Daniel Brown, J. Melchior, D. Haran, T. Duffey, Tanuj Aggarwal
Publikováno v:
SPIE Proceedings.
Semiconductor market demand for improved performance at lower cost continues to drive enhancements in excimer light source technologies. Increased output power, reduced variability in key light source parameters, and improved beam stability are requi
Autor:
Theodore Cacouris, R. Rokitski, Bernd Burfeindt, Rajasekhar M. Rao, R. Jiang, Kevin M. O'brien, John T. Melchior
Publikováno v:
SPIE Proceedings.
Deep UV (DUV) lithography is being applied to pattern increasingly finer geometries, leading to solutions like double- and multiple-patterning. Such process complexities lead to higher costs due to the increasing number of steps required to produce t
Autor:
Theodore Cacouris, Toshi Ishihara, Daniel J. W. Brown, Mary Haviland, R. Rokitski, Rajeskar Rao, R. Jiang
Publikováno v:
SPIE Proceedings.
Double patterning lithography places significant demands not only on the optical performance of the light source (higher power, improved parametric stability), but also on high uptime in order to meet the higher throughput requirements of the litho c
Autor:
R. Rokitski, Shaya Fainman
Publikováno v:
Optics express. 11(13)
We perform 3D cross-correlation measurements of the optical field distribution resulting from an ultrashort pulse propagating in 6 meters of multimode fiber. Spatial amplitude and phase distributions of the optical field at the output of the fiber ar
Autor:
William N. Partlo, Theodore Cacouris, Hong Ye, Fedor B. Trintchouk, Robert N. Jacques, Daniel J. W. Brown, Robert J. Rafac, Robert A. Bergstedt, Rajasekhar M. Rao, R. Rokitski, Toshihiko Ishihara, Vladimir B. Fleurov
Publikováno v:
SPIE Proceedings.
Deep ultraviolet (DUV) lithography improvements have been focused on two paths: further increases in the effective numerical aperture (NA) beyond 1.3, and double patterning (DP). High-index solutions for increasing the effective NA have not gained si
Publikováno v:
Optics letters. 25(16)
In response to a comment on our Letter [Opt. Lett. 25, 132 (2000)], we reiterate the distinction between the spectral inversion and the spectral phase conjugation processing techniques. The former achieves time reversal of the complex amplitude wavef
Publikováno v:
Optics letters. 25(2)
Two different realizations of time-reversal experiments of ultrafast waveforms are carried out in real time by use of four-wave mixing arrangements of spectrally decomposed waves. The first, conventional, method is based on phase conjugation of the w
Autor:
Kevin Tetz, Kazuhiro Ikeda, Maxim Abashin, Hyo-Chang Kim, Uriel Levy, Lin Pang, Yeshaiahu Fainman, Maziar P. Nezhad, R. Rokitski
Publikováno v:
SPIE Proceedings.
Optical technology plays an increasingly important role in numerous applications areas, including communications, information processing, and data storage. However, as optical technology develops, it is evident that there is a growing need to develop
Autor:
Yeshaiahu Fainman, Uriel Levy, R. Rokitski, Kevin Tetz, Hyu-Chang Kim, Chia-Ho Tsai, Maxim Abashin, Lin Pang, Maziar Zezhad
Publikováno v:
SPIE Proceedings.
Optical technology plays an increasingly important role in numerous information system applications, including optical communications, storage, signal processing, biology, medicine, and sensing. As optical technology develops, there is a growing need