Zobrazeno 1 - 10
of 29
pro vyhledávání: '"R. Pierrisnard"'
Autor:
D. Tonneau, Vincent Bouchiat, R. Even, H. Dallaporta, V. I. Safarov, R. Pierrisnard, F. Marchi, P. Doppelt
Publikováno v:
Microelectronic Engineering. 50:59-65
Single electron devices are of great interest for their possible replacement of transistors in memories. The key to the preparation of these components is the production of low capacitance dots, which requires a lithography step at nanometric scale.
Autor:
F. Marchi, D. Tonneau, P. Doppelt, Vincent Bouchiat, R. Even, V. I. Safarov, H. Dallaporta, R. Pierrisnard
Publikováno v:
Le Journal de Physique IV. :Pr8-733
Direct patterning of nanometric metallic features is possible by local decomposition of gaseous molecules on a surface, induced by application of a pulse voltage on a STM tip while surface imaging. Decomposition reaction occurs above a threshold volt
Autor:
F. Salvan, L. Masson, F. Thibaudau, Ph. Dumas, W. Marine, D. Tonneau, R. Pierrisnard, D. Albertini, H. Dallaporta, M. Ramonda
Publikováno v:
Microelectronic Engineering. 30:443-446
Silicon clusters have been promoted by thermal decomposition of silane (SiH4) on silicon (111)-(7×7). The adsorption of silane molecule at room temperature has been studied and a mechanism for adsorption is proposed. The sticking coefficient at room
Publikováno v:
The European Physical Journal B: Condensed Matter and Complex Systems
The European Physical Journal B: Condensed Matter and Complex Systems, 2000, 14 (2), pp.371-376. ⟨10.1007/s100510050141⟩
ResearcherID
The European Physical Journal B: Condensed Matter and Complex Systems, Springer-Verlag, 2000, 14 (2), pp.371-376. ⟨10.1007/s100510050141⟩
The European Physical Journal B: Condensed Matter and Complex Systems, 2000, 14 (2), pp.371-376. ⟨10.1007/s100510050141⟩
ResearcherID
The European Physical Journal B: Condensed Matter and Complex Systems, Springer-Verlag, 2000, 14 (2), pp.371-376. ⟨10.1007/s100510050141⟩
International audience; We report here a preparation for thin gold films on mica substrates. We have investigated the influence of the substrate temperature and the evaporation rate on the morphology of the films. After careful outgasing of the subst
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::73b72ab370442609d942fab7df6b4370
https://hal-amu.archives-ouvertes.fr/hal-01770307
https://hal-amu.archives-ouvertes.fr/hal-01770307
Publikováno v:
Journal de Physique IV Proceedings
Journal de Physique IV Proceedings, EDP Sciences, 1995, 05 (C5), pp.C5-629-C5-635. ⟨10.1051/jphyscol:1995575⟩
Journal de Physique IV Proceedings, EDP Sciences, 1995, 05 (C5), pp.C5-629-C5-635. ⟨10.1051/jphyscol:1995575⟩
Copper thin films have been deposited by thermal decomposition of copper acetylacetonate-oxygen mixtures. Copper films of high quality as observed by Auger Electron Spectroscopy (AES) have been obtained at temperatures as low as 300°C. Under UV illu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8d1689e922170559619336a5fac5f6c4
https://hal.archives-ouvertes.fr/jpa-00253937
https://hal.archives-ouvertes.fr/jpa-00253937
Publikováno v:
Journal de Physique IV Proceedings
Journal de Physique IV Proceedings, EDP Sciences, 1991, 02 (C2), pp.C2-889-C2-895. ⟨10.1051/jp4:19912106⟩
Journal de Physique IV Proceedings, EDP Sciences, 1991, 02 (C2), pp.C2-889-C2-895. ⟨10.1051/jp4:19912106⟩
In this paper we present a study of copper CVD deposition on different types of substrates used for microelectronic devices. The influence of substrate temperature, pressure, flux and contamination effect of the gas phase has been determined to obtai
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d5e741492ac3fa098b695b8b49e9ff68
https://hal.archives-ouvertes.fr/jpa-00249784/file/ajp-jp4199102C2106.pdf
https://hal.archives-ouvertes.fr/jpa-00249784/file/ajp-jp4199102C2106.pdf
Publikováno v:
Journal of Optics. 16:47-51
A spectrophotometer is described which allows specular reflectance measurements at near normal and oblique incidence (30-44-60-75 degrees ). The samples can be heated up to 800 degrees C. The spectral range extends from 0.22 to 6.0 mu m. Reflectivity
Publikováno v:
Applied Surface Science. 43:165-170
The Au x Si 1- x ( x = 0.34, 0.76) alloys have been prepared by electron beam evaporation under ultra-high vacuum conditions. Their morphologies, before and after laser irradiation, have been studied by transmission electron microscopy. Depending on
Publikováno v:
Europhysics Letters (EPL). 10:533-536
Three-dimensional gold clusters deposited in UHV on clean natural graphite are imaged at the atomic level using scanning tunnelling microscopy (STM). After STM observation, the samples are characterized by transmission electron microscopy (TEM). The
Publikováno v:
Solid State Communications. 15:1613-1617
Resume On donne, entre 0,32 et 5,5 eV, l'absorption optique de couches minces de vanadium obtenue a partir de mesures de transmission et de reflexion. Ces couches ont ete preparees sous ultra-vide et etudiees in situ. On note la presence d'une large